SCHEMBL27424952

SCHEMBL27424952

C=CCn1c(=O)n(CC(O)COc2ccc(C=C(C#N)C#N)cc2)c(=O)n(CC(O)COc2ccc(C=C(C#N)C#N)cc2)c1=O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.45
HTT P42858 1/20 0.45
MAPT P10636 8/20 0.40
ALDH1A1 P00352 7/20 0.40
KDM4E B2RXH2 6/20 0.40
NPSR1 Q6W5P4 4/20 0.39
CYP3A4 P08684 3/20 0.39
HPGD P15428 2/20 0.39
CYP1A2 P05177 2/20 0.39
TSHR P16473 1/20 0.39
NFKB1 P19838 1/20 0.39
APEX1 P27695 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
POLB P06746 1/20 0.37
PLA2G4A P47712 2/20 0.36
EGFR P00533 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24710438 0.92 KDM4E (0.46) LMNAMAPTALDH1A1KDM4ENPSR1
SCHEMBL27424954 0.92 ADRB2 (0.41) LMNAHTTMAPTALDH1A1KDM4E
SCHEMBL27424953 0.84 ADRB2 (0.36) LMNAMAPTALDH1A1KDM4ENPSR1
SCHEMBL27424809 0.83 MAPT (0.43) LMNAMAPTALDH1A1KDM4ENPSR1
SCHEMBL27424772 0.83 MAPT (0.43) LMNAMAPTALDH1A1KDM4ENPSR1
SCHEMBL4367726 0.80 LMNA (0.56) LMNAHTTMAPTALDH1A1KDM4E
SCHEMBL27424876 0.79 KDM4E (0.47) MAPTALDH1A1KDM4ECYP3A4HPGD
SCHEMBL27424847 0.76 KDM4E (0.47) LMNAMAPTALDH1A1KDM4EHPGD
SCHEMBL27424810 0.75 ADRB2 (0.41) LMNAMAPTALDH1A1KDM4ENPSR1
SCHEMBL22823089 0.74 ALDH1A1 (0.40) LMNAMAPTALDH1A1KDM4ENPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed