SCHEMBL27424871

SCHEMBL27424871

CO[Si](CCc1ccccc1)(OC)OC(C)NCCN

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 10/20 0.38
CYP2A6 P11509 1/20 0.36
HTR2A P28223 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
LOXL2 Q9Y4K0 1/20 0.36
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
KMT2A Q03164 1/20 0.35
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2904115 0.79 TAAR1 (0.50) SIGMAR1CYP2A6HTR2ASMN1; SMN2TAAR1
SCHEMBL28118715 0.78 SLC6A2 (0.40) SIGMAR1CYP2A6HTR2ATAAR1CYP2D6
Ethylenediamine SCHEMBL17417251 0.77 HTR2A (0.50) CYP2A6HTR2ASMN1; SMN2TAAR1LOXL2
SCHEMBL8775073 0.75 PKM (0.37) SMN1; SMN2TAAR1CYP2D6CYP2C19KMT2A
SCHEMBL1614971 0.75 HTR2A (0.38) CYP2A6HTR2ASMN1; SMN2TAAR1LOXL2
SCHEMBL17417253 0.75 SIGMAR1 (0.39) SIGMAR1CYP2A6HTR2ASMN1; SMN2TAAR1
SCHEMBL37761 0.74 SIGMAR1 (0.42) SIGMAR1
SCHEMBL106416 0.74 TDP1 (0.46) CYP2A6HTR2ASMN1; SMN2TAAR1LOXL2
SCHEMBL29029448 0.73 CASR (0.43) SIGMAR1SMN1; SMN2KMT2A
SCHEMBL447454 0.73 DRD2 (0.46) SIGMAR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102582254-B Method of and apparatus for forming a metal pattern KOREA ELECTRONICS TELECOMM 2014-11-05 CN claimed
CN-102582254-A Method of and apparatus for forming a metal pattern KOREA ELECTRONICS TELECOMM 2012-07-18 CN claimed
CN-107406755-A Thermochromic film 柯尼卡美能达株式会社 2017-11-28 CN disclosed
CN-104487520-B Curable organopolysiloxane composition, method for producing same, method for producing organopolysiloxane cured product, method for condensing organopolysiloxane, optical semiconductor sealed body, and condensation catalyst for organopolysiloxane 三菱化学株式会社 2017-03-15 CN disclosed
CN-102582254-B Method of and apparatus for forming a metal pattern KOREA ELECTRONICS TELECOMM 2014-11-05 CN disclosed
CN-102582254-A Method of and apparatus for forming a metal pattern KOREA ELECTRONICS TELECOMM 2012-07-18 CN disclosed
CN-1125375-C Waterless lithographic plate TORAY INDUSTRIES (JP) 2003-10-22 CN disclosed
CN-1115187-A Waterless lithographic plate TORAY INDUSTRIES (JP) 1996-01-17 CN disclosed