Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 2/20 | 0.46 |
| ▸ | DRD4 | P21917 | 2/20 | 0.46 |
| ▸ | DRD3 | P35462 | 2/20 | 0.46 |
| ▸ | SIGMAR1 | Q99720 | 7/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28175344 | 0.96 | SIGMAR1 (0.44) | DRD2DRD4DRD3SIGMAR1 | |
| SCHEMBL37761 | 0.93 | SIGMAR1 (0.42) | DRD2DRD4DRD3SIGMAR1KDM4E | |
| SCHEMBL1603369 | 0.89 | SIGMAR1 (0.44) | DRD2DRD4DRD3SIGMAR1MEN1 | |
| SCHEMBL37400 | 0.88 | DRD2 (0.44) | DRD2DRD4DRD3SIGMAR1GAA | |
| SCHEMBL28789259 | 0.88 | SIGMAR1 (0.39) | DRD2DRD4DRD3SIGMAR1MEN1 | |
| Aniline SCHEMBL28077933 | 0.87 | SIGMAR1 (0.38) | DRD2DRD4DRD3SIGMAR1KDM4E | |
| SCHEMBL3476726 | 0.87 | MAOA (0.46) | — | |
| Ethylene SCHEMBL28046221 | 0.87 | SIGMAR1 (0.41) | DRD2DRD4DRD3SIGMAR1MEN1 | |
| SCHEMBL17417253 | 0.86 | SIGMAR1 (0.39) | SIGMAR1KDM4ELMNA | |
| SCHEMBL28073223 | 0.85 | DRD2 (0.38) | DRD2DRD4DRD3SIGMAR1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4869964-A | Oxidation resistant compositions for use with rare earth magnets | THE B. F. GOODRICH COMPANY (US) | 1989-09-26 | — | — | US | claimed |
| US-12261143-B2 | Method of manufacturing substrate layered body and layered body | MITSUI CHEMICALS, INC. (JP) | 2025-03-25 | — | — | US | disclosed |
| CN-119654696-A | Method for manufacturing substrate laminate and semiconductor device | 三井化学株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-119497906-A | Method for producing substrate laminate and substrate laminate | 三井化学株式会社 | 2025-02-21 | — | — | CN | disclosed |
| WO-2025005084-A1 | SUBSTRATE LAMINATE | 三井化学株式会社 | 2025-01-02 | — | — | WO | disclosed |
| CN-115956098-B | Composition, laminate, and method for producing laminate | 三井化学株式会社 | 2024-11-26 | — | — | CN | disclosed |
| WO-2024225232-A1 | SEMICONDUCTOR STRUCTURE AND METHOD FOR PRODUCING SAME | 三井化学株式会社 | 2024-10-31 | — | — | WO | disclosed |
| WO-2024177116-A1 | PRODUCTION METHOD FOR SEMICONDUCTOR CHIP WITH RESIN LAYER AND PRODUCTION METHOD FOR SUBSTRATE LAMINATE | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024177149-A1 | SEMICONDUCTOR STRUCTURE AND METHOD FOR PRODUCING SAME | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024177074-A1 | METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-8901186-B2 | Process for producing silica-comprising dispersions comprising polyetherols or polyether amines | BASF SE (DE) | 2014-12-02 | — | — | US | disclosed |
| EP-2614118-A1 | SILICON DIOXIDE DISPERSIONS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| EP-2337806-B1 | METHOD FOR PRODUCING POLYOL DISPERSIONS CONTAINING SILICA | BASF SE (DE) | 2013-03-27 | — | — | EP | disclosed |
| US-20120065341-A1 | SILICON DIOXIDE DISPERSIONS | BASF SE (DE) | 2012-03-15 | — | — | US | disclosed |
| WO-2012032099-A1 | SILICON DIOXIDE DISPERSIONS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| US-20110313070-A1 | PROCESS FOR PRODUCING SILICA-COMPRISING DISPERSIONS COMPRISING POLYETHEROLS OR POLYETHER AMINES | BASF SE (DE) | 2011-12-22 | — | — | US | disclosed |
| US-20110266497-A1 | PROCESS FOR PRODUCING SILICA-COMPRISING POLYOL DISPERSIONS AND THEIR USE FOR PRODUCING POLYURETHANE MATERIALS | BASF SE (DE) | 2011-11-03 | — | — | US | disclosed |
| US-20060004121-A1 | Polymer-brush modified fillers for composites | REGENTS OF THE UNIVERSITY OF COLORADO, THE | 2006-01-05 | — | — | US | disclosed |
| WO-1992005433-A1 | CONTINUOUS POSITIVE CHARGE CAPILLARY COLUMNS USED IN CAPILLARY ELECTROPHORESIS | KERR ROBERT (FR) | 1992-04-02 | — | — | WO | disclosed |
| US-4689422-A | Novel ligand catalyst systems formed by reaction of carbonyl compounds with organosilicon compounds | TEXACO INC. (US) | 1987-08-25 | — | — | US | disclosed |