Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | ALDH1A2 | O94788 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.34 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.34 |
| ▸ | DPP7 | Q9UHL4 | 2/20 | 0.32 |
| ▸ | TLR2 | O60603 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16330483 | 0.90 | CA1 (0.30) | — | |
| SCHEMBL18671015 | 0.82 | PTGS1 (0.47) | ALDH1A2ALDH1A1ALDH2ALDH1A3PTGS1 | |
| SCHEMBL14409945 | 0.81 | EPHX1 (0.48) | DPP7 | |
| SCHEMBL14544234 | 0.80 | DPP7 (0.42) | PTGS1KCNH2DPP7 | |
| SCHEMBL16330488 | 0.79 | CA2 (0.35) | — | |
| SCHEMBL16330477 | 0.79 | PTGS1 (0.37) | ALDH1A2ALDH1A1ALDH2ALDH1A3PTGS1 | |
| SCHEMBL26041010 | 0.79 | KISS1R (0.38) | ALDH1A2ALDH1A1ALDH2ALDH1A3PTGS1 | |
| SCHEMBL22296783 | 0.78 | ADRA1A (0.50) | EPHX2ALDH1A2ALDH1A1ALDH2ALDH1A3 | |
| SCHEMBL13697295 | 0.78 | ALOX15 (0.37) | ALDH1A2ALDH1A1ALDH2ALDH1A3PTGS1 | |
| SCHEMBL20326432 | 0.77 | RRM1 (0.38) | ALDH1A2ALDH1A1ALDH2ALDH1A3PTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090197200-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |