SCHEMBL2747290

SCHEMBL2747290

O=C(O)c1ccc(Oc2ccc(C3C4CC5CC(C4)CC3(c3ccc(Oc4ccc(C(=O)O)cc4)cc3)C5)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 4/20 0.43
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
EPHX2 P34913 5/20 0.40
PARP15 Q460N3 1/20 0.40
PARP10 Q53GL7 1/20 0.40
RXRA P19793 1/20 0.39
RXRB P28702 1/20 0.39
RXRG P48443 1/20 0.39
HIF1A Q16665 2/20 0.38
EPAS1 Q99814 2/20 0.38
HSD11B1 P28845 2/20 0.36
HSD11B2 P80365 1/20 0.36
GAA P10253 1/20 0.36
MAPT P10636 1/20 0.36
XBP1 P17861 1/20 0.36
THRB P10828 1/20 0.36
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2746122 0.92 MEN1 (0.46) SRD5A2MEN1KMT2AEPHX2HIF1A
SCHEMBL19362954 0.83 SRD5A2 (0.47) SRD5A2MEN1KMT2AEPHX2PARP15
SCHEMBL16088381 0.82 LMNA (0.35) MEN1KMT2AEPHX2MAPT
SCHEMBL19362904 0.78 MEN1 (0.55) SRD5A2MEN1KMT2AEPHX2PARP15
SCHEMBL2747640 0.77 MMP2 (0.38) MEN1KMT2AEPHX2GAAMAPT
SCHEMBL23210653 0.76 PARP10 (0.49) SRD5A2KMT2AEPHX2PARP15PARP10
SCHEMBL23210656 0.76 PARP10 (0.49) SRD5A2KMT2AEPHX2PARP15PARP10
SCHEMBL2747207 0.75 ESR2 (0.45) MEN1KMT2AEPHX2GAAMAPT
SCHEMBL28270976 0.74 MEN1 (0.31) MEN1KMT2AGAAMAPTXBP1
SCHEMBL2747023 0.73 HIF1A (0.46) SRD5A2MEN1KMT2APARP15PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed