SCHEMBL2747640

SCHEMBL2747640

Nc1ccc(Oc2ccc(C3C4CC5CC(C4)CC3(c3ccc(Oc4ccc(N)c(O)c4)cc3)C5)cc2)cc1O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.38
MMP14 P50281 1/20 0.38
GAA P10253 3/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
MAPT P10636 2/20 0.34
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.34
THRB P10828 1/20 0.34
HPGD P15428 1/20 0.34
ALOX15 P16050 1/20 0.34
ALOX12 P18054 1/20 0.34
HTT P42858 1/20 0.34
HSD17B10 Q99714 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
XBP1 P17861 1/20 0.34
EPHX2 P34913 3/20 0.34
POLB P06746 1/20 0.33
GFER P55789 1/20 0.33
ESR1 P03372 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747175 0.83 MEN1 (0.41) GAAMEN1KMT2AMAPTALDH1A1
SCHEMBL5086572 0.80 MEN1 (0.50) MMP2MMP14GAAMEN1KMT2A
SCHEMBL16088381 0.79 LMNA (0.35) MEN1KMT2AMAPTALDH1A1KDM4E
SCHEMBL2747207 0.78 ESR2 (0.45) GAAMEN1KMT2AMAPTALDH1A1
SCHEMBL2747290 0.77 SRD5A2 (0.43) GAAMEN1KMT2AMAPTTHRB
SCHEMBL2746967 0.75 MEN1 (0.41) GAAMEN1KMT2AALDH1A1HPGD
SCHEMBL2710593 0.75 ESR1 (0.48) MMP2MMP14GAAMEN1KMT2A
SCHEMBL28205290 0.75 ALDH1A1 (0.53) GAAMEN1KMT2AALDH1A1L3MBTL1
SCHEMBL2709018 0.74 MMP2 (0.43) MMP2MMP14GAAMEN1KMT2A
SCHEMBL2748102 0.73 MEN1 (0.31) GAAMEN1KMT2AMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed