SCHEMBL2747566

SCHEMBL2747566

Nc1ccc(Oc2ccc3cc(C#Cc4ccccc4)ccc3c2-c2c(Oc3ccc(N)c(O)c3)ccc3cc(C#Cc4ccccc4)ccc23)cc1O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ASIC3 Q9UHC3 3/20 0.41
GAA P10253 1/20 0.40
RCE1 Q9Y256 1/20 0.40
GRM5 P41594 2/20 0.38
FFAR1 O14842 3/20 0.36
MAPT P10636 2/20 0.36
LMNA P02545 1/20 0.36
HTT P42858 1/20 0.36
HNF4A P41235 1/20 0.35
CYP1A2 P05177 2/20 0.33
CYP1A1 P04798 1/20 0.33
CYP1B1 Q16678 1/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
HAO1 Q9UJM8 1/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747334 0.84 GAA (0.36) GAARCE1MAPTLMNAHTT
SCHEMBL4436991 0.81 ASIC3 (0.41) ASIC3GRM5FFAR1MAPTHNF4A
SCHEMBL2747475 0.81 GAA (0.49) GAARCE1MAPTLMNAHTT
SCHEMBL2747065 0.79 MMP2 (0.31)
SCHEMBL2748466 0.79 HAO1 (0.42) GAARCE1FFAR1MAPTCYP1A2
SCHEMBL2746914 0.77 MAPT (0.42) GAARCE1FFAR1MAPTCYP1A2
SCHEMBL4436986 0.76 ASIC3 (0.39) ASIC3GRM5HTTCYP1A2CYP1A1
SCHEMBL2747066 0.75 NPC1 (0.41) FFAR1MAPTHNF4ACYP1A2CA12
SCHEMBL2747297 0.75 GAA (0.38) GAARCE1FFAR1MAPTLMNA
SCHEMBL23965442 0.74 HNF4A (0.51) ASIC3GRM5MAPTHNF4ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed