SCHEMBL2747567

SCHEMBL2747567

C#Cc1cc2cc(-c3ccccc3)ccc2c(-c2c(Oc3ccc(N)c(O)c3)ccc3cc(-c4ccccc4)ccc23)c1Oc1ccc(N)c(O)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 7/20 0.41
ESR2 Q92731 7/20 0.41
HSD17B1 P14061 9/20 0.38
HSD17B2 P37059 9/20 0.38
CYP1A2 P05177 5/20 0.38
CYP3A4 P08684 5/20 0.38
CYP2C9 P11712 5/20 0.38
CYP2C19 P33261 5/20 0.38
CYP2D6 P10635 4/20 0.38
CYP2B6 P20813 4/20 0.38
GAA P10253 2/20 0.33
RCE1 Q9Y256 1/20 0.33
GPR84 Q9NQS5 1/20 0.32
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
USP2 O75604 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
HSP90AA1 P07900 1/20 0.32
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4436987 0.81 ESR1 (0.34) ESR1ESR2HSD17B1HSD17B2CYP1A2
SCHEMBL2747067 0.78 MEN1 (0.34) GAAMEN1KMT2A
SCHEMBL2747334 0.76 GAA (0.36) ESR1ESR2CYP3A4GAARCE1
SCHEMBL2747566 0.73 ASIC3 (0.41) ESR1ESR2HSD17B1HSD17B2CYP1A2
SCHEMBL2747475 0.72 GAA (0.49) GAARCE1KDM4EMEN1ALDH1A1
SCHEMBL2747299 0.72 GAA (0.35) ESR1CYP3A4GAARCE1ALDH1A1
SCHEMBL2748471 0.72 ALOX15 (0.38) ESR1CYP3A4GAARCE1KDM4E
SCHEMBL2747068 0.72 ESR1 (0.37) ESR1ESR2GAALMNAMAPT
SCHEMBL2748123 0.70 ESR1 (0.36) ESR1CYP3A4GAAKDM4EMEN1
SCHEMBL2747603 0.69 NR4A1 (0.40) ESR1ESR2CYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed