SCHEMBL2748795

SCHEMBL2748795

Brc1ccc(C2C3CC4CC(C3)CC2(c2ccc(Br)cc2)C4)cc1

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LIG1 P18858 1/20 0.38
MEN1 O00255 1/20 0.37
RAD52 P43351 1/20 0.37
KMT2A Q03164 1/20 0.37
KDM1A O60341 8/20 0.35
RCOR1 Q9UKL0 5/20 0.35
KCNH2 Q12809 2/20 0.35
MAOB P27338 2/20 0.35
KDM1B Q8NB78 1/20 0.35
P2RX7 Q99572 1/20 0.35
ALDH1A1 P00352 2/20 0.33
LMNA P02545 2/20 0.33
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HTR2C P28335 1/20 0.32
HTR2B P41595 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28205290 0.83 ALDH1A1 (0.53) MEN1KMT2AP2RX7ALDH1A1LMNA
SCHEMBL2747207 0.83 ESR2 (0.45) MEN1KMT2AKDM1AP2RX7ALDH1A1
SCHEMBL5561167 0.79 KDM1A (0.38) KDM1AMAOBP2RX7ALDH1A1LMNA
SCHEMBL2746122 0.78 MEN1 (0.46) MEN1KMT2AP2RX7ALDH1A1KDM4E
SCHEMBL28270976 0.76 MEN1 (0.31) MEN1KMT2AALDH1A1LMNARAB9A
SCHEMBL16088381 0.76 LMNA (0.35) MEN1KMT2AKDM1AKCNH2MAOB
SCHEMBL28275699 0.72 TDP1 (0.47) MEN1KMT2AALDH1A1LMNARAB9A
SCHEMBL14480337 0.72 MEN1 (0.55) MEN1RAD52KMT2AALDH1A1LMNA
SCHEMBL2709413 0.70 LMNA (0.63) LIG1MEN1RAD52KMT2AALDH1A1
SCHEMBL25709655 0.70 LMNA (0.63) LIG1MEN1RAD52KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed