Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.74 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.74 |
| ▸ | MAPT | P10636 | 9/20 | 0.74 |
| ▸ | F2 | P00734 | 4/20 | 0.74 |
| ▸ | VDR | P11473 | 3/20 | 0.74 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.69 |
| ▸ | HPGD | P15428 | 7/20 | 0.69 |
| ▸ | MEN1 | O00255 | 5/20 | 0.68 |
| ▸ | HTT | P42858 | 3/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | THRB | P10828 | 1/20 | 0.55 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
| ▸ | XBP1 | P17861 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27842380 | 0.89 | KDM4E (0.72) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL4830026 | 0.85 | KDM4E (1.00) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL27489087 | 0.84 | KDM4E (0.53) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL8488334 | 0.83 | KDM4E (0.75) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL64368 | 0.82 | KDM4E (1.00) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL29370293 | 0.81 | VDR (1.00) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL64277 | 0.81 | VDR (1.00) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL2468373 | 0.81 | KMT2A (1.00) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL8778106 | 0.80 | KDM4E (0.76) | KDM4EALDH1A1MAPTF2VDR | |
| SCHEMBL7886651 | 0.80 | KDM4E (0.75) | KDM4EALDH1A1MAPTF2VDR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1574234-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| CN-104115256-A | Photocured product and method for producing the same | CANON KK | 2014-10-22 | — | — | CN | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-103907174-A | Method of forming film | CANON KK | 2014-07-02 | — | — | CN | disclosed |
| CN-102341731-B | Coloring composition, color filter and color liquid crystal display element | JSR CORP | 2014-06-25 | — | — | CN | disclosed |
| CN-101952269-B | Sulphonium salt initiators | BASF SE | 2014-06-25 | — | — | CN | disclosed |
| CN-102026967-B | Sulphonium salt initiators | CIBA HOLDING INC | 2013-09-18 | — | — | CN | disclosed |
| CN-102089870-B | Gate insulating material, gate insulating film, and organic field effect transistor | TORAY INDUSTRIES | 2013-08-28 | — | — | CN | disclosed |
| CN-1908816-B | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORP | 2012-09-05 | — | — | CN | disclosed |
| CN-102548744-A | Manufacturing method for plastic member and plastic member | CANON KK | 2012-07-04 | — | — | CN | disclosed |
| CN-100383665-C | Onium salts and their use as latent acids | CIBA SC HOLDING AG (CH) | 2008-04-23 | — | — | CN | disclosed |
| CN-101002090-A | Method of printing a time-temperature indicator based on azo coupling reactions onto a substrate | CIBA SC HOLDING AG (CH) | 2007-07-18 | — | — | CN | disclosed |
| CN-1989455-A | Oxime derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2007-06-27 | — | — | CN | disclosed |
| CN-1934499-A | Positively radiation-sensitive resin composition | JSR CORP (JP) | 2007-03-21 | — | — | CN | disclosed |
| CN-1908816-A | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORP (JP) | 2007-02-07 | — | — | CN | disclosed |
| CN-1751269-A | Halogenated oxime derivatives and their use as latent acids | CIBA SC HOLDING AG (CH) | 2006-03-22 | — | — | CN | disclosed |
| CN-1662853-A | Onium salts and their use as latent acids | CIBA SC HOLDING AG (CH) | 2005-08-31 | — | — | CN | disclosed |
| CN-1196029-C | Positive radiation-sensitive composition | TORAY INDUSTRIES (JP) | 2005-04-06 | — | — | CN | disclosed |
| CN-1574234-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| CN-1287630-A | Positive radiation-sensitive composition | TORAY INDUSTRIES (JP) | 2001-03-14 | — | — | CN | disclosed |