SCHEMBL274972

SCHEMBL274972

ClC(Cl)(Cl)c1nc(-c2ccc(C#Cc3ccccc3)cc2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.41
MAPT P10636 1/20 0.38
GRM5 P41594 4/20 0.36
CYP1A2 P05177 2/20 0.36
CYP1A1 P04798 1/20 0.36
CYP1B1 Q16678 1/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
PKM P14618 1/20 0.35
HPGD P15428 1/20 0.35
ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL274973 0.85 GRM5 (0.41) GRM5CYP1A2CYP1A1CYP1B1NPC1
SCHEMBL125466 0.83 MEN1 (0.44) MAPTCYP1A2MEN1KMT2ANPC1
SCHEMBL80527 0.83 MEN1 (0.47) MAPTCYP1A2MEN1KMT2ANPC1
SCHEMBL4900598 0.83 MEN1 (0.47) MAPTCYP1A2MEN1KMT2ANPC1
SCHEMBL10225765 0.82 CHAT (0.46) MAPTGRM5CYP1A2MEN1KMT2A
SCHEMBL8412982 0.81 NPC1 (0.38) MAPTMEN1KMT2ANPC1RAB9A
SCHEMBL3310276 0.81 TP53 (0.37) MAPTCYP1A2KMT2ANPC1RAB9A
SCHEMBL3312117 0.81 ADK (0.41) MAPTCYP1A2NPC1RAB9ASMN1; SMN2
SCHEMBL274985 0.81 APP (0.45) APPMAPTCYP1A2CYP1A1CYP1B1
SCHEMBL13845115 0.80 KEAP1 (0.37) NPC1RAB9AHDAC6MAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3182204-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION FUJIFILM CORP (JP) 2021-10-20 EP disclosed
EP-2109000-B1 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same FUJIFILM CORP (JP) 2017-02-22 EP disclosed
EP-1564591-B1 Polymerizable composition FUJIFILM CORP (JP) 2016-08-03 EP disclosed
EP-1403710-B1 Polymerizable composition FUJIFILM CORP (JP) 2015-06-10 EP disclosed
EP-2085220-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same FUJIFILM CORP (JP) 2015-05-20 EP disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8669040-B2 Method of manufacturing relief printing plate and printing plate precursor for laser engraving FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
US-8669040-B2 Method of manufacturing relief printing plate and printing plate precursor for laser engraving FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
EP-2106906-B1 Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORP (JP) 2013-08-14 EP disclosed
US-20070231740-A1 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
EP-1839853-A1 Planographic printing plate precursor and stack thereof FUJIFILM Corporation (JP) 2007-10-03 EP disclosed
US-7267925-B2 Photosensitive composition and novel compound used therefor FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
US-7267925-B2 Photosensitive composition and novel compound used therefor FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed