SCHEMBL275046

SCHEMBL275046

C=C(C)NC(=O)OCC(CC)(CO)CO

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
TP53 P04637 1/20 0.38
CYP3A4 P08684 1/20 0.38
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HIF1A Q16665 1/20 0.38
THRB P10828 1/20 0.33
KDM4E B2RXH2 1/20 0.32
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15435259 0.81 TSHR (0.34) CYP3A4KDM4EPKM
SCHEMBL275045 0.79 TSHR (0.33) CYP3A4KDM4EPKM
SCHEMBL5247448 0.78 EPHX1 (0.41) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL30451 0.77 THRB (0.44) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL5248828 0.77 CHRNB2 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL3683178 0.75 ALDH1A1 (0.44) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL2637971 0.75 THRB (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL3756979 0.75 THRB (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL5264945 0.75 THRB (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Ethylene Glycol SCHEMBL2356475 0.74 THRB (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
EP-2131239-B1 Processing liquid for lithographic printing plate development and method of producing lithographic printing plates FUJIFILM CORP (JP) 2016-03-23 EP disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8303860-B2 Colored curable composition, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2012-11-06 US disclosed
US-7531291-B2 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
US-20090099320-A1 LASER-DECOMPOSABLE RESIN COMPOSITION AND LASER-DECOMPOSABLE PATTERN-FORMING MATERIAL AND FLEXOGRAPHIC PRINTING PLATE PRECURSOR OF LASER ENGRAVING TYPE USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-16 US disclosed
US-20090087790-A1 METHOD OF PRODUCING A NEGATIVE PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-7374863-B2 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJIFILM CORPORATION (JP) 2008-05-20 US disclosed
US-20080057437-A1 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
EP-1762896-A2 Method of producing photosensitive planographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed