SCHEMBL275045

SCHEMBL275045

C=C(C)NC(=O)OCC(C)(CO)CO

nearest known ligand 0.33

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
LMNA P02545 2/20 0.33
CYP3A4 P08684 1/20 0.33
NFKB1 P19838 1/20 0.33
ADRA1A P35348 1/20 0.33
RAB9A P51151 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HSD17B10 Q99714 1/20 0.32
KDM4E B2RXH2 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15435259 0.91 TSHR (0.34) TSHRLMNACYP3A4NFKB1ADRA1A
SCHEMBL275046 0.79 ALDH1A1 (0.38) CYP3A4KDM4EPKM
SCHEMBL5247568 0.76 NFKB1 (0.41) TSHRLMNACYP3A4NFKB1ADRA1A
SCHEMBL5244425 0.75 SMN1; SMN2 (0.42) TSHRLMNACYP3A4NFKB1ADRA1A
SCHEMBL65529 0.75 TSHR (0.45) TSHRLMNACYP3A4TDP1HSD17B10
SCHEMBL11514847 0.73 ALDH1A1 (0.42) TSHRLMNACYP3A4RAB9ATDP1
SCHEMBL9659162 0.71
SCHEMBL1494601 0.71 TSHR (0.45) TSHRLMNACYP3A4TDP1HSD17B10
SCHEMBL27238380 0.71 LMNA (0.40) TSHRLMNACYP3A4NFKB1ADRA1A
SCHEMBL274759 0.71 ACHE (0.33) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
EP-1564591-B1 Polymerizable composition FUJIFILM CORP (JP) 2016-08-03 EP disclosed
EP-2131239-B1 Processing liquid for lithographic printing plate development and method of producing lithographic printing plates FUJIFILM CORP (JP) 2016-03-23 EP disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20090099320-A1 LASER-DECOMPOSABLE RESIN COMPOSITION AND LASER-DECOMPOSABLE PATTERN-FORMING MATERIAL AND FLEXOGRAPHIC PRINTING PLATE PRECURSOR OF LASER ENGRAVING TYPE USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-16 US disclosed
US-20090087790-A1 METHOD OF PRODUCING A NEGATIVE PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-7374863-B2 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJIFILM CORPORATION (JP) 2008-05-20 US disclosed
US-20080057437-A1 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
EP-1767995-A2 Method of producing photosensitive planographic printing plate precursor FUJIFILM Corporation (JP) 2007-03-28 EP disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
EP-1762896-A2 Method of producing photosensitive planographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed