SCHEMBL27512460

SCHEMBL27512460

O=C(OC1=CC(=O)N(N2C(=O)CCC2=O)C1=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 11/20 0.50
MAPK1 P28482 1/20 0.44
MAPT P10636 6/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
ALDH1A1 P00352 3/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
STAT3 P40763 1/20 0.39
RAB9A P51151 1/20 0.39
PKM P14618 2/20 0.38
F2 P00734 1/20 0.38
LMNA P02545 1/20 0.38
MEN1 O00255 3/20 0.38
HSD17B10 Q99714 1/20 0.37
HPGD P15428 2/20 0.36
PLA2G7 Q13093 1/20 0.36
PARP10 Q53GL7 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11694814 0.70 KMT2A (0.55) KMT2AMAPTSMN1; SMN2ALDH1A1RAB9A
SCHEMBL31197024 0.69 KMT2A (0.53) KMT2AMAPTSMN1; SMN2ALDH1A1CYP1A2
SCHEMBL3143807 0.69 KMT2A (0.53) KMT2AMAPK1MAPTSMN1; SMN2ALDH1A1
SCHEMBL133554 0.67 KMT2A (0.53) KMT2AMAPK1MAPTSMN1; SMN2ALDH1A1
SCHEMBL19309377 0.67 KMT2A (0.53) KMT2AMAPK1MAPTSMN1; SMN2ALDH1A1
SCHEMBL6780333 0.66 ALDH1A1 (0.33) KMT2AMAPTALDH1A1LMNAMEN1
SCHEMBL25263447 0.65 KMT2A (0.50) KMT2AMAPK1MAPTSMN1; SMN2ALDH1A1
SCHEMBL9341204 0.65 KMT2A (0.49) KMT2AMAPTSMN1; SMN2ALDH1A1CYP1A2
Benzoyl Peroxide SCHEMBL1315128 0.65 F2 (0.61) KMT2AMAPK1MAPTSMN1; SMN2ALDH1A1
SCHEMBL5475783 0.65 TOP1 (0.50) KMT2AMAPTSMN1; SMN2ALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103298841-A Photosensitive resin composition, and dielectric insulating film and electronic device using the same ROHM & HAAS ELECT MAT 2013-09-11 CN claimed
CN-100428027-C Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device JSR CO LTD (JP) 2008-10-22 CN claimed
CN-106444285-B Photosensitive resin composition for color filter and application thereof 奇美实业股份有限公司 2021-09-10 CN disclosed
CN-104718498-B Method for producing permanent film for optical material, cured film, organic EL display device, and liquid crystal display device 富士胶片株式会社 2019-12-17 CN disclosed
CN-104298074-B Transparent pixels are formed with photosensitive polymer combination and the colour filter formed using it TONGWOO FINE CHEMICALS CO., LTD. (KR) 2019-11-01 CN disclosed
CN-108873137-A The polarizer and its manufacturing method 住友化学株式会社 2018-11-23 CN disclosed
CN-106569389-A Self-luminescent photosensitive resin composition, color filter and image display device including the color filter 东友精细化工有限公司 2017-04-19 CN disclosed
CN-102967970-B The manufacture method of array base palte, liquid crystal display cells and array base palte JSR CO., LTD. (JP) 2016-05-25 CN disclosed
CN-105589297-A COLORED CURABLE RESIN COMPOSITION SUMITOMO CHEMICAL CO 2016-05-18 CN disclosed
CN-105319851-A Radiation sensitive linear resin composition, insulation film and display member JSR CORP 2016-02-10 CN disclosed
CN-105103042-A Array substrate, liquid crystal display element, and radiation-sensitive resin composition JSR CORP 2015-11-25 CN disclosed
CN-1683461-A Resin composition and protective film JSR CORP (JP) 2005-10-19 CN disclosed
CN-1677139-A Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device JSR CO LTD (JP) 2005-10-05 CN disclosed
CN-1216320-C Radiation sensitive refractivity change composition and method for changing refractivity JSR CORP (JP) 2005-08-24 CN disclosed
CN-1645220-A Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device JSR CO LTD (JP) 2005-07-27 CN disclosed
CN-1550893-A Solidified resin pattern forming method 住友化学工业株式会社 2004-12-01 CN disclosed
CN-1542548-A Radiation-sensitive resin composition 住友化学工业株式会社 2004-11-03 CN disclosed
CN-1458209-A Resin composition and protective film JSR CORP (JP) 2003-11-26 CN disclosed
CN-1427043-A Particle, composition and protective film JSR CORP (JP) 2003-07-02 CN disclosed
CN-1427306-A Radiation sensitive refractivity change composition and method for changing refractivity JSR CORP (JP) 2003-07-02 CN disclosed