Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.35 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA6 | P23280 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29207385 | 0.87 | HTR6 (0.39) | HTR6PSIP1ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL3421644 | 0.79 | HTR6 (0.45) | HTR6PSIP1ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL245358 | 0.77 | PSIP1 (0.52) | HTR6PSIP1ALDH1A1CA2KEAP1 | |
| SCHEMBL2839087 | 0.76 | TDP1 (0.47) | PSIP1ALDH1A1SMN1; SMN2TDP1TSHR | |
| SCHEMBL29207376 | 0.76 | TDP1 (0.37) | HTR6PSIP1ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL23430474 | 0.74 | CA2 (0.48) | ALDH1A1SMN1; SMN2CA2HDAC3HDAC4 | |
| SCHEMBL1286162 | 0.73 | TDP1 (0.44) | PSIP1SMN1; SMN2PKMTDP1 | |
| SCHEMBL2229511 | 0.73 | CA2 (0.40) | ALDH1A1SMN1; SMN2KDM4ELMNAPKM | |
| SCHEMBL7328957 | 0.71 | KEAP1 (0.54) | PSIP1ALDH1A1CA2KEAP1NFE2L2 | |
| SCHEMBL972458 | 0.71 | SMN1; SMN2 (0.48) | HTR6PSIP1ALDH1A1SMN1; SMN2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115960483-A | Method for reducing shrinkage stress of photocureable coating by using pH-responsive cationic microgel | 江南大学 | 2023-04-14 | — | — | CN | disclosed |
| CN-107073516-A | Method for producing structure having concave pattern, resin composition, method for forming conductive film, electronic circuit, and electronic device | JSR株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-102859439-B | Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof | JSR株式会社 | 2017-06-30 | — | — | CN | disclosed |
| CN-102243386-B | Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof | JSR株式会社 | 2016-08-10 | — | — | CN | disclosed |
| CN-102870047-B | Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof | JSR CORP. (JP) | 2016-03-02 | — | — | CN | disclosed |
| CN-105143977-A | Method for producing substrate having concave pattern, composition, method for forming conductive film, electronic circuit, and electronic device | JSR CORP | 2015-12-09 | — | — | CN | disclosed |
| CN-102955188-B | The manufacture method of colored filter, liquid crystal display cells and colored filter | JSR CO., LTD. (JP) | 2015-12-09 | — | — | CN | disclosed |
| CN-102566278-B | Siloxane polymer composition, cured film and method for forming the cured film | JSR CORP | 2015-01-21 | — | — | CN | disclosed |
| CN-102870045-B | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2014-11-19 | — | — | CN | disclosed |
| CN-102213918-B | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-101907828-A | Radiation-ray sensitive composition, diaphragm, interlayer dielectric and their formation method | JSR CORP | 2010-12-08 | — | — | CN | disclosed |
| CN-100430828-C | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2008-11-05 | — | — | CN | disclosed |
| CN-1273869-C | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2006-09-06 | — | — | CN | disclosed |
| CN-1225509-C | Radiation-sensitive composition capable of having refractive index distribution | JSR CORP (JP) | 2005-11-02 | — | — | CN | disclosed |
| CN-1216320-C | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1582414-A | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2005-02-16 | — | — | CN | disclosed |
| CN-1462298-A | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORP (JP) | 2003-12-17 | — | — | CN | disclosed |
| CN-1457349-A | Radiation-sensitive composition capable of having refractive index distribution | JSR CORP (JP) | 2003-11-19 | — | — | CN | disclosed |
| CN-1427306-A | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| CN-1388919-A | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2003-01-01 | — | — | CN | disclosed |