Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 2/20 | 0.45 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA3 | P07451 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA5A | P35218 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29207385 | 0.85 | HTR6 (0.39) | HTR6PSIP1CA1CA2ALDH1A1 | |
| SCHEMBL18562275 | 0.83 | HTR6 (0.42) | HTR6PSIP1CA1CA2ALDH1A1 | |
| SCHEMBL20904616 | 0.83 | PSIP1 (0.48) | HTR6PSIP1CA1CA2ALDH1A1 | |
| SCHEMBL2440752 | 0.80 | HTR6 (0.45) | HTR6PSIP1CA1CA2ALDH1A1 | |
| SCHEMBL3421960 | 0.79 | ALDH1A1 (0.47) | CA1CA2ALDH1A1TSHRHSD11B1 | |
| SCHEMBL2839087 | 0.79 | TDP1 (0.47) | PSIP1ALDH1A1SMN1; SMN2TDP1TSHR | |
| SCHEMBL29207376 | 0.79 | TDP1 (0.37) | HTR6PSIP1CA1CA2ALDH1A1 | |
| SCHEMBL23430474 | 0.77 | CA2 (0.48) | CA2ALDH1A1SMN1; SMN2 | |
| SCHEMBL29114838 | 0.77 | KEAP1 (0.46) | ALDH1A1SMN1; SMN2TSHRHSD11B1KEAP1 | |
| SCHEMBL2229511 | 0.75 | CA2 (0.40) | CA2ALDH1A1SMN1; SMN2TDP1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | claimed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | claimed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | claimed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | claimed |
| US-8455176-B2 | Coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-04 | — | — | US | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-20100119972-A1 | COATING COMPOSITION | MERCK PATENT GMBH (DE) | 2010-05-13 | — | — | US | disclosed |
| US-7547501-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100119972-A1 | COATING COMPOSITION | S100A9, CAPG, C5 | HTR6 3330/4885PSIP1 2121/4885CA1 382/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.