SCHEMBL27593199

SCHEMBL27593199

CCCCCCCS(=O)(=O)Oc1cccc2c1C(=O)NC2=O

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ ALPL P05186 1/20 0.41
▸ ALPI P09923 1/20 0.41
▸ ELANE P08246 3/20 0.39
▸ SOAT1 P35610 10/20 0.38
▸ KDM4E B2RXH2 2/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ GAA P10253 1/20 0.38
▸ HPGD P15428 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ POLM Q9NP87 1/20 0.38
▸ POLK Q9UBT6 1/20 0.38
▸ POLL Q9UGP5 1/20 0.38
▸ POLH Q9Y253 1/20 0.38
▸ CASP3 P42574 1/20 0.36
▸ MEN1 O00255 1/20 0.36
▸ POLB P06746 1/20 0.36
▸ KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27611345 1.00 ALPL (0.41) ALPLALPIELANESOAT1KDM4E
SCHEMBL28110463 0.80 ELANE (0.38) ELANEPOLMPOLKPOLLPOLH
SCHEMBL4593117 0.80 PRKCA (0.45) ELANEKDM4EALDH1A1GAAHPGD
SCHEMBL1027363 0.76 KDM4E (0.43) KDM4EALDH1A1GAAHPGDHSD17B10
SCHEMBL2882285 0.76 ALPL (0.54) ALPLALPISOAT1ALDH1A1
SCHEMBL9481549 0.76 KDM4E (0.41) SOAT1KDM4EALDH1A1GAAHPGD
SCHEMBL29868095 0.75 KMT2A (0.47) ELANEKDM4EALDH1A1GAAHPGD
SCHEMBL4965022 0.74 ALPL (0.52) ALPLALPISOAT1ALDH1A1
SCHEMBL9768590 0.72 KDM4E (0.51) KDM4EALDH1A1GAAHPGDHSD17B10
SCHEMBL7648225 0.72 CYP2A6 (0.43) ELANEKDM4EALDH1A1GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1575438-A Photoacid generators in photoresist compositions for microlithography DU PONT (US) 2005-02-02 — — CN claimed
CN-1575438-A Photoacid generators in photoresist compositions for microlithography DU PONT (US) 2005-02-02 — — CN disclosed
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