Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 3/20 | 0.40 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.38 |
| ▸ | BACE1 | P56817 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.34 |
| ▸ | JAK3 | P52333 | 1/20 | 0.34 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SNCA | P37840 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.33 |
| ▸ | CAMKK2 | Q96RR4 | 1/20 | 0.33 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL27512684 | 0.90 | NUDT1 (0.40) | APPNUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL15512040 | 0.84 | TRPA1 (0.48) | NUDT1BACE1HSP90AA1PSMB5ACMSD | |
| Ethane SCHEMBL28106473 | 0.81 | BACE1 (0.44) | APPNUDT1BACE1HSP90AA1PTGS2 | |
| SCHEMBL27648065 | 0.79 | NUDT1 (0.33) | NUDT1BACE1HSP90AA1PSMB5ACMSD | |
| SCHEMBL5527391 | 0.78 | NUDT1 (0.42) | NUDT1BACE1HSP90AA1PSMB5ACMSD | |
| Ethane SCHEMBL28833111 | 0.78 | TDP1 (0.42) | NUDT1BACE1HSP90AA1PTGS2HDAC2 | |
| Ethane SCHEMBL28868993 | 0.77 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5ACMSD | |
| SCHEMBL28149225 | 0.77 | APP (0.56) | APPNUDT1BACE1HSP90AA1PTGS2 | |
| Ethane SCHEMBL27615405 | 0.77 | NUDT1 (0.46) | APPNUDT1BACE1HSP90AA1PTGS2 | |
| SCHEMBL15511757 | 0.77 | TRPA1 (0.47) | NUDT1BACE1HSP90AA1PSMB5ACMSD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-107179652-A | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-09-19 | — | — | CN | disclosed |
| CN-106918989-A | Photosensitive polysiloxane composition, protective film and module with protective film | 奇美实业股份有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-103797418-B | A kind of negative light-sensitive resin combination, pattern formation method, cured film, dielectric film, colour filter and display device | 东京应化工业株式会社 | 2017-06-13 | — | — | CN | disclosed |
| CN-103901728-B | Photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-06-06 | — | — | CN | disclosed |
| CN-106338888-A | Photosensitive resin composition, protective film and element | 奇美实业股份有限公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-103728833-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-106054527-A | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2016-10-26 | — | — | CN | disclosed |
| CN-106019847-A | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2016-10-12 | — | — | CN | disclosed |
| CN-103424990-B | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-102443265-B | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2013-06-05 | — | — | CN | disclosed |
| CN-102841504-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI CORP | 2012-12-26 | — | — | CN | disclosed |
| CN-102778816-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI COOPERATION | 2012-11-14 | — | — | CN | disclosed |
| CN-102566273-A | Positive photosensitive resin composition and method for forming pattern | QIMEI IND CO LTD | 2012-07-11 | — | — | CN | disclosed |
| CN-102540727-A | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2012-07-04 | — | — | CN | disclosed |
| CN-102445852-A | Positive photosensitive resin composition and method for forming pattern | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-102443265-A | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-101907827-B | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-101907827-A | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2010-12-08 | — | — | CN | disclosed |
| CN-1584742-A | Positive light sensitive resin composition | QIMEI IND CO LTD (CN) | 2005-02-23 | — | — | CN | disclosed |