Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.42 |
| ▸ | BACE1 | P56817 | 1/20 | 0.42 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | G6PD | P11413 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3787886 | 0.90 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL9136538 | 0.84 | NUDT1 (0.40) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL5526208 | 0.82 | ELANE (0.35) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL8897907 | 0.82 | ACMSD (0.48) | NUDT1BACE1ACMSDKDM4EKMT2A | |
| Ethane SCHEMBL28868993 | 0.81 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL7522760 | 0.79 | HSP90AA1 (0.38) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL5520487 | 0.79 | PTPN5 (0.44) | NUDT1BACE1HSP90AA1FEN1PTPN5 | |
| SCHEMBL15512040 | 0.79 | TRPA1 (0.48) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| SCHEMBL9138938 | 0.78 | NUDT1 (0.34) | NUDT1BACE1HSP90AA1ACMSDKDM4E | |
| Ethane SCHEMBL27596791 | 0.78 | APP (0.40) | NUDT1BACE1HSP90AA1ACMSDMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-10414850-B2 | Resin containing phenolic hydroxyl groups, and resist film | DIC CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| US-20190077901-A1 | NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM | DIC CORPORATION (JP) | 2019-03-14 | — | — | US | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-20180346635-A1 | NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-12-06 | — | — | US | disclosed |
| US-20180334523-A1 | NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-11-22 | — | — | US | disclosed |
| US-20180327533-A1 | RESIN CONTAINING PHENOLIC HYDROXYL GROUPS, AND RESIST FILM | DIC CORPORATION (JP) | 2018-11-15 | — | — | US | disclosed |
| US-9975830-B2 | Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film | DIC CORPORATION (JP) | 2018-05-22 | — | — | US | disclosed |
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9963536-B2 | Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film | DIC CORPORATION (JP) | 2018-05-08 | — | — | US | disclosed |
| EP-1469353-A1 | TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME | JSR Corporation (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-20040131963-A1 | Two-layer film and method of forming pattern with the same | JSR CORPORATION (JP) | 2004-07-08 | — | — | US | disclosed |
| US-5677102-A | DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| US-5604077-A | MIXTURE OF ALKALI-SOLUBLE NOVOLAK AND A QUINONE DIAZIDE PHOTOSENSITIZER; HEAT RESISTANCE, RESOLUTION, ANTIFOULING AGENTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-18 | — | — | US | disclosed |
| US-5601961-A | QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-11 | — | — | US | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| US-5401605-A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | HACL2, ASH2L, HEATR1 | NUDT1 3338/4885BACE1 2648/4885HSP90AA1 53/4885 |
| US-20180334523-A1 | NOVOLAC RESIN AND RESIST FILM | ASH2L, PRRC2C, ACSL1 | NUDT1 4033/4885BACE1 1977/4885HSP90AA1 606/4885 |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | HACL2, ASH2L, HEATR1 | NUDT1 3338/4885BACE1 2648/4885HSP90AA1 53/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.