Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1613930 | 0.92 | TSHR (0.37) | TSHR | |
| SCHEMBL3735549 | 0.84 | TSHR (0.36) | TSHR | |
| SCHEMBL9811787 | 0.80 | TSHR (0.40) | TSHR | |
| SCHEMBL11340916 | 0.78 | MAPT (0.30) | — | |
| SCHEMBL1151516 | 0.78 | TSHR (0.41) | TSHR | |
| SCHEMBL691186 | 0.77 | TSHR (0.46) | TSHR | |
| SCHEMBL5084661 | 0.77 | MAPT (0.36) | TSHR | |
| SCHEMBL10520704 | 0.76 | POLB (0.38) | TSHR | |
| SCHEMBL11619198 | 0.75 | — | — | |
| SCHEMBL2200972 | 0.75 | TSHR (0.37) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6177524-B1 | RING-OPENING ADDITION PRODUCT OF (METH)ACRYLOYL GROUP-CONTAINING CARBOXYLIC ACID TO EPOXY GROUPS OF AN EPOXIDED CONJUGATED DIENE-VINYLAROMATIC BLOCK POLYMER | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 2001-01-23 | — | — | US | claimed |
| EP-0899275-A1 | BLOCK COPOLYMER HAVING (METH)ACRYLOYL GROUPS IN THE SIDE CHAINS AND COMPOSITION CONTAINING THE SAME | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 1999-03-03 | — | — | EP | claimed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20070166636-A1 | Electrophotographic toner and electrophotographic developer and image forming method | FUJI XEROX CO., LTD. (JP) | 2007-07-19 | — | — | US | disclosed |
| US-20060071203-A1 | Coating composition and optical article | TOKUYAMA CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1568739-A1 | COATING COMPOSITION AND OPTICAL ARTICLE | Tokuyama Corporation (JP) | 2005-08-31 | — | — | EP | disclosed |
| EP-0785034-B1 | Coating method | KANSAI PAINT CO LTD (JP) | 2002-11-06 | — | — | EP | disclosed |
| US-6177524-B1 | RING-OPENING ADDITION PRODUCT OF (METH)ACRYLOYL GROUP-CONTAINING CARBOXYLIC ACID TO EPOXY GROUPS OF AN EPOXIDED CONJUGATED DIENE-VINYLAROMATIC BLOCK POLYMER | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 2001-01-23 | — | — | US | disclosed |
| EP-0899275-A1 | BLOCK COPOLYMER HAVING (METH)ACRYLOYL GROUPS IN THE SIDE CHAINS AND COMPOSITION CONTAINING THE SAME | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 1999-03-03 | — | — | EP | disclosed |
| US-5756221-A | ELECTRODEPOSITION OF CATIONIC POLYMER | KANSAI PAINT CO., LTD. (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0785034-A1 | Coating method | KANSAI PAINT CO., LTD. (JP) | 1997-07-23 | — | — | EP | disclosed |
| US-5610249-A | FREE RADICAL CATALYST, ORGANIC PHOSPHORUS COMPOUND | KANSAI PAINT CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | TSHR 1154/4885 |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | BLM, HPRT1, BROX | TSHR 1373/4885 |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | HPRT1, GNG2, BLM | TSHR 2081/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | TSHR 1154/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.