SCHEMBL27701700

SCHEMBL27701700

NC(=CC(=O)O)c1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.50
CA2 P00918 4/20 0.50
CA1 P00915 3/20 0.50
KMT2A Q03164 3/20 0.50
CA12 O43570 2/20 0.50
CA3 P07451 2/20 0.50
TYR P14679 2/20 0.50
CA4 P22748 2/20 0.50
CA6 P23280 2/20 0.50
CA5A P35218 2/20 0.50
CA7 P43166 2/20 0.50
CA9 Q16790 2/20 0.50
CA14 Q9ULX7 2/20 0.50
CA5B Q9Y2D0 2/20 0.50
ALDH1A1 P00352 1/20 0.50
DRD1 P21728 1/20 0.50
CPT1B Q92523 1/20 0.46
LMNA P02545 3/20 0.46
ESR1 P03372 2/20 0.46
ESR2 Q92731 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4240914 0.82 TDP1 (0.54) MAPTCA2CA1KMT2ACA12
SCHEMBL28337358 0.82 TDP1 (0.54) MAPTCA2CA1KMT2ACA12
SCHEMBL4240912 0.82 TDP1 (0.54) MAPTCA2CA1KMT2ACA12
SCHEMBL5202093 0.81 CES2 (0.48) MAPTCA2CA1ALDH1A1PKM
SCHEMBL6662810 0.81 ALOX15 (0.52) MAPTCA2CA1ALDH1A1LMNA
SCHEMBL5202085 0.81 CES2 (0.48) MAPTCA2CA1ALDH1A1PKM
SCHEMBL6662812 0.81 ALOX15 (0.52) MAPTCA2CA1ALDH1A1LMNA
SCHEMBL7121173 0.79 NQO2 (0.56) MAPTCA2CA1KMT2ACA12
SCHEMBL7121170 0.79 NQO2 (0.56) MAPTCA2CA1KMT2ACA12
SCHEMBL7598129 0.77 CA2 (0.54) MAPTCA2CA1KMT2ACA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114539362-A Botulinum toxin specific substrate peptide, detection kit and detection method 中国疾病预防控制中心传染病预防控制所 2022-05-27 CN claimed
CN-103163736-A Composition including polyamide acid for forming lower layer reflection preventing film NISSAN CHEMICAL IND LTD 2013-06-19 CN claimed
CN-101010634-A Composition for forming lower layer antireflection film containing polyamic acid NISSAN CHEMICAL IND LTD (JP) 2007-08-01 CN claimed
CN-103163736-A Composition including polyamide acid for forming lower layer reflection preventing film NISSAN CHEMICAL IND LTD 2013-06-19 CN disclosed
CN-101010634-A Composition for forming lower layer antireflection film containing polyamic acid NISSAN CHEMICAL IND LTD (JP) 2007-08-01 CN disclosed