SCHEMBL5383989

SCHEMBL5383989

C=Cc1ccc(OC(C)(C)C)cc1.C=Cc1ccc(OC(OC)C(C)C)cc1.C=Cc1ccccc1O

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 1/20 0.32
ABCB1 P08183 1/20 0.32
BCR P11274 1/20 0.32
RELA Q04206 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2771513 0.92 ABL1 (0.37) ABL1ABCB1BCRRELA
SCHEMBL5381887 0.86 ABL1 (0.38) ABL1ABCB1BCRRELA
SCHEMBL547158 0.81 RELA (0.32) ABL1ABCB1BCRRELA
Indene SCHEMBL2770682 0.79 CYP2D6 (0.30)
SCHEMBL5388961 0.79 ABL1 (0.32) ABL1ABCB1BCRRELA
SCHEMBL989083 0.78 ALDH1A1 (0.41)
SCHEMBL5393323 0.77 CHRNB2 (0.33) ABL1ABCB1BCRRELA
SCHEMBL5550087 0.76 MAPT (0.38) ABL1ABCB1BCR
SCHEMBL2770233 0.75 L3MBTL1 (0.33)
SCHEMBL6371474 0.74 MAPT (0.33) ABL1ABCB1BCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7267923-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-09-11 US disclosed
US-20070148584-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-28 US disclosed