SCHEMBL547158

SCHEMBL547158

C1=Cc2cccc3cccc1c23.C=Cc1ccc(OC(OC)C(C)C)cc1.C=Cc1ccccc1O

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
RELA Q04206 1/20 0.32
ABL1 P00519 1/20 0.30
ABCB1 P08183 1/20 0.30
BCR P11274 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL925059 0.88 S100B (0.31)
SCHEMBL2771513 0.88 ABL1 (0.37) RELAABL1ABCB1BCR
SCHEMBL3131329 0.86 NPC1 (0.32)
SCHEMBL15048618 0.85 RELA (0.45) RELAABL1ABCB1BCR
Indene SCHEMBL2770682 0.82 CYP2D6 (0.30)
SCHEMBL5383989 0.81 ABL1 (0.32) RELAABL1ABCB1BCR
SCHEMBL15048556 0.80 RRM1 (0.36)
4-Vinylphenol SCHEMBL925066 0.80
Styrene SCHEMBL15048584 0.78 ALDH1A1 (0.41)
SCHEMBL546354 0.77 TRIM24 (0.38) RELA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8110335-B2 Resist patterning process and manufacturing photo mask SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-02-07 US disclosed
US-20100009271-A1 Resist patterning process and manufacturing photo mask SHIN-ETSU CHEMICAL CO., LTD (JP) 2010-01-14 US disclosed