Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB known ✓ | P27338 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 3/20 | 0.43 |
| ▸ | RAB9A | P51151 | 3/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | CASP3 | P42574 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.43 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.43 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | SHBG | P04278 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.38 |
| ▸ | APP | P05067 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL2773087 | 1.00 | NPC1 (0.43) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL13016 | 0.87 | NPC1 (0.50) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| Iodide SCHEMBL5175074 | 0.85 | NPC1 (0.48) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL2769553 | 0.85 | NPC1 (0.36) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| Sulfuric Acid SCHEMBL4384843 | 0.81 | NPC1 (0.41) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL4733508 | 0.80 | LMNA (0.45) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL25870778 | 0.79 | NPC1 (0.44) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| Hydrochloric Acid SCHEMBL28138846 | 0.78 | LMNA (0.43) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL779443 | 0.78 | NPC1 (0.58) | NPC1RAB9AMAPK1SMN1; SMN2LMNA | |
| SCHEMBL16266071 | 0.77 | NPC1 (0.41) | NPC1RAB9AMAPK1SMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1117002-B1 | Negative-working resist composition | FUJIFILM CORP (JP) | 2010-04-14 | — | — | EP | disclosed |
| EP-1076261-B1 | Negative resist composition | FUJIFILM CORP (JP) | 2008-06-25 | — | — | EP | disclosed |
| EP-1602481-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-6887645-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-6720128-B2 | AMPLIFICATION; ACCURACY PATTERN PROFILE; EXPOSURE TO ELECTRON BEAMS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-13 | — | — | US | disclosed |
| US-6511783-B1 | Triphenylsulfonium acid generators; phenolic crosslinking agent; amplification; photosensitivity, resolution | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-20020061462-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| EP-1193555-A1 | Negative resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-6265135-B1 | ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-1117004-A2 | Electron beam or x-ray negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1117002-A1 | Negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |