SCHEMBL4733508

SCHEMBL4733508

CCC(C)(C)c1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.45
ALDH1A1 P00352 3/20 0.43
TSHR P16473 2/20 0.43
NT5E P21589 1/20 0.43
NPC1 O15118 3/20 0.43
RAB9A P51151 3/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
MAPK1 P28482 1/20 0.43
CASP3 P42574 1/20 0.43
ATM Q13315 1/20 0.43
SENP8 Q96LD8 1/20 0.43
SENP7 Q9BQF6 1/20 0.43
SENP6 Q9GZR1 1/20 0.43
MAPT P10636 1/20 0.42
KDM2B Q8NHM5 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
SHBG P04278 1/20 0.39
POLB P06746 3/20 0.39
CYP2C9 P11712 1/20 0.39
CNR2 P34972 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28138846 0.98 LMNA (0.43) LMNAALDH1A1TSHRNT5ENPC1
SCHEMBL22864018 0.84 LMNA (0.45) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL6537145 0.84 SHBG (0.59) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL10181733 0.83 NPC1 (0.46) LMNAALDH1A1TSHRNPC1RAB9A
SCHEMBL10180558 0.82 PSIP1 (0.50) LMNAALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL10181070 0.82 ENPP2 (0.45) LMNAALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL29010459 0.81 LMNA (0.42) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL6537146 0.80 CNR2 (0.49) CNR2
Sulfuric Acid SCHEMBL2773086 0.80 NPC1 (0.43) LMNAALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL22518681 0.80 NPC1 (0.43) LMNAALDH1A1TSHRNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4297284-A BY THE CYCLIZATION OF ISOBUTENYL-PYROCATECHOL OR A MIXTURE WITH METHALLYLPYROCATECHOL USING A SULFONIC ACID CATALYST RHONE-POULENC AGROCHIMIE (FR) 1981-10-27 US claimed
US-20230295457-A1 SURFACE TREATMENT LIQUID AND SURFACE TREATMENT METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-21 US disclosed
US-20220160281-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING BIO-ELECTRODE, AND REACTION COMPOSITE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-05-26 US disclosed
EP-3553147-B1 SURFACE TREATMENT LIQUID AND SURFACE TREATMENT METHOD TOKYO OHKA KOGYO CO LTD (JP) 2022-05-11 EP disclosed
US-11160480-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-02 US disclosed
US-20200113464-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-16 US disclosed
US-20190127578-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-05-02 US disclosed
US-9874829-B2 Dispersant for liquid development, liquid developer, liquid developer cartridge, image forming apparatus, and image forming method FUJI XEROX CO., LTD. (JP) 2018-01-23 US disclosed
US-20170277055-A1 DISPERSANT FOR LIQUID DEVELOPMENT, LIQUID DEVELOPER, LIQUID DEVELOPER CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD FUJI XEROX CO., LTD. (JP) 2017-09-28 US disclosed
US-9760003-B2 Pattern forming method and actinic-ray- or radiation-sensitive resin composition FUJIFILM CORPORATION (JP) 2017-09-12 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7442485-B2 Lithographic process involving on press development FUJIFILM CORPORATION (JP) 2008-10-28 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
WO-2008076046-A1 NOVEL 2-AMINO-5, 5-DIARYL-IMIDAZOL-4-ONES ASTRAZENECA AB (SE) 2008-06-26 WO disclosed
US-20070229637-A1 Ink set for ink-jet recording and ink-jet recording method FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-4440625-A N,N-DIALKYLHYDROXYLAMINE, SURFACTANT ATLANTIC RICHFIELD CO. (US) 1984-04-03 US disclosed
US-4425223-A AN ORGANIC PHOSPHITE OR PHOSPHATE ESTER AND A SULFONIC ACID ATLANTIC RICHFIELD COMPANY (US) 1984-01-10 US disclosed
US-4297284-A BY THE CYCLIZATION OF ISOBUTENYL-PYROCATECHOL OR A MIXTURE WITH METHALLYLPYROCATECHOL USING A SULFONIC ACID CATALYST RHONE-POULENC AGROCHIMIE (FR) 1981-10-27 US disclosed