Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 9/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | HRH2 | P25021 | 6/20 | 0.50 |
| ▸ | HRH1 | P35367 | 6/20 | 0.50 |
| ▸ | MMP2 | P08253 | 3/20 | 0.50 |
| ▸ | MAOB | P27338 | 1/20 | 0.48 |
| ▸ | MMP3 | P08254 | 3/20 | 0.47 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.46 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.46 |
| ▸ | MMP1 | P03956 | 1/20 | 0.46 |
| ▸ | MMP9 | P14780 | 1/20 | 0.46 |
| ▸ | MMP13 | P45452 | 1/20 | 0.46 |
| ▸ | TBXAS1 | P24557 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9653965 | 0.94 | MMP2 (0.58) | HRH3HRH2HRH1MMP2MMP3 | |
| SCHEMBL22645668 | 0.94 | HRH3 (0.54) | HRH3MAPTALDH1A1HRH2HRH1 | |
| SCHEMBL72415 | 0.89 | ALDH1A1 (0.53) | HRH3MAPTALDH1A1HRH2HRH1 | |
| SCHEMBL9852404 | 0.89 | MMP3 (0.57) | HRH3HRH2HRH1MMP2MMP3 | |
| SCHEMBL28887343 | 0.87 | HDAC1 (0.58) | HRH3ALDH1A1HRH2HRH1MMP2 | |
| SCHEMBL16798363 | 0.87 | HDAC1 (0.58) | HRH3ALDH1A1HRH2HRH1MMP2 | |
| SCHEMBL7384498 | 0.87 | HRH3 (0.59) | HRH3MAPTALDH1A1HRH2HRH1 | |
| SCHEMBL5519875 | 0.87 | HRH3 (0.62) | HRH3MAPTALDH1A1HRH2HRH1 | |
| SCHEMBL7983991 | 0.85 | HRH3 (0.66) | HRH3MAPTALDH1A1HRH2HRH1 | |
| SCHEMBL7387284 | 0.85 | HRH3 (0.66) | HRH3MAPTALDH1A1HRH2HRH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10840397-B2 | Highly-fluorescent and photo-stable chromophores for wavelength conversion | NITTO DENKO CORPORATION (JP) | 2020-11-17 | — | — | US | claimed |
| CN-113354590-A | Quinazolinone compound for antagonizing NOD1/2 receptor signal pathway | 宁波康柏睿格医药科技有限公司 | 2021-09-07 | — | — | CN | disclosed |
| US-10289002-B2 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10042247-B2 | Mask blank, method for manufacturing mask blank and transfer mask | HOYA CORPORATION (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20170285460-A1 | MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK | HOYA CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9645494-B2 | Resist underlayer film forming composition containing low molecular weight dissolution accelerator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160363863-A1 | ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| EP-2095189-B1 | COMPOSITION FOR FORMING RESIST FOUNDATION FILM CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL IND LTD (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-2085823-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | NISSAN CHEMICAL IND LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| US-7842620-B2 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-30 | — | — | US | disclosed |
| US-20100291483-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20100075253-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL INDUSTRIES , LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |