SCHEMBL2779962

SCHEMBL2779962

CCCC1(c2ccccc2)CC2C=CC1C2

nearest known ligand 0.37

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MAOB P27338 8/20 0.37
MAOA P21397 5/20 0.37
KDM1A O60341 2/20 0.37
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
OPRK1 P41145 1/20 0.35
OPRM1 P35372 1/20 0.31
OPRL1 P41146 1/20 0.31
MAPT P10636 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1733504 0.91 OPRM1 (0.38) MAOBMAOAKDM1ACYP2D6CYP2C19
SCHEMBL1733139 0.87 CYP2D6 (0.41) MAOBMAOAKDM1ACYP2D6CYP2C19
SCHEMBL6528313 0.71 MAOA (0.41) MAOBMAOAKDM1ACYP2D6CYP2C19
SCHEMBL231895 0.71 MAOA (0.41) MAOBMAOAKDM1ACYP2D6CYP2C19
SCHEMBL11740261 0.71 MAOB (0.36) MAOBMAOAKDM1AOPRK1OPRM1
SCHEMBL745582 0.68 PTGS2 (0.44) MAOBMAOAOPRM1OPRL1MAPT
SCHEMBL1732130 0.68 MAOB (0.52) MAOBMAOAKDM1A
SCHEMBL1733750 0.68 MAOB (0.34) MAOBMAOAKDM1AOPRM1
SCHEMBL1732423 0.68 MAOB (0.34) MAOBMAOAKDM1AOPRM1
SCHEMBL17988245 0.67 KDM1A (0.44) MAOBMAOAKDM1AOPRK1OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9242407-B2 Resin for thermal imprinting SCIVAX CORPORATION (JP) 2016-01-26 US disclosed
US-20140339735-A1 RESIN FOR THERMAL IMPRINTING SCIVAX CORPORATION (JP) 2014-11-20 US disclosed
US-8721950-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2014-05-13 US disclosed
US-8597769-B2 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article MARUZEN PETROCHEMICAL CO. LTD. (JP) 2013-12-03 US disclosed
US-20130056906-A1 RESIN FOR THERMAL IMPRINT MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-8324332-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2012-12-04 US disclosed
US-20100310830-A1 Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-12-09 US disclosed
EP-2221162-A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE Maruzen Petrochemical CO., LTD. (JP) 2010-08-25 EP disclosed
US-20100189985-A1 THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
US-20100189984-A1 THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
EP-2163565-A1 RESIN FOR THERMAL IMPRINTING, RESIN SOLUTION FOR THERMAL IMPRINTING, INJECTION MOLDED BODY FOR THERMAL IMPRINTING, THIN FILM FOR THERMAL IMPRINTING, AND PROCESS FOR PRODUCING THE THIN FILM MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-03-17 EP disclosed
US-20100019410-A1 Resin for Thermal Imprinting SCIVAX CORPORATION (JP) 2010-01-28 US disclosed
US-20100013122-A1 Resin for Thermal Imprint SCIVAX CORPORATON (JP) 2010-01-21 US disclosed
EP-1930349-A1 RESIN FOR THERMAL IMPRINT Scivax Corporation (JP) 2008-06-11 EP disclosed