SCHEMBL28047937

SCHEMBL28047937

COc1ccccc1S(=O)(=O)C=[N+]=[N-]

nearest known ligand 0.54

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 11/20 0.54
HTR6 P50406 1/20 0.50
KCNH2 Q12809 1/20 0.50
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA4 P22748 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
KMT2A Q03164 1/20 0.38
PKM P14618 1/20 0.38
KAT6A Q92794 1/20 0.37
NPC1 O15118 1/20 0.36
TSHR P16473 1/20 0.36
ACLY P53396 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6306651 0.77 LMNA (0.51) NFE2L2HTR6KMT2APKM
SCHEMBL1516201 0.77 RAPGEF4 (0.36) NFE2L2KMT2ATSHR
SCHEMBL5248910 0.77 HTR6 (0.55) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL3174665 0.75 NFE2L2 (0.34) NFE2L2HTR6KCNH2CA1CA2
SCHEMBL31352974 0.73 HTR6 (0.77) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL3160926 0.72 HTR6 (0.50) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL30514823 0.71 HTR6 (0.62) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL498677 0.71 HTR6 (0.62) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL69581 0.71 HTR6 (0.62) NFE2L2HTR6KCNH2CA12CA1
SCHEMBL31540724 0.71 NFE2L2 (0.78) NFE2L2HTR6KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106458812-B Containing modified phenolic hydroxyl-compounds, the preparation method containing modified phenolic hydroxyl-compounds, photosensitive composite, protection materials and protection film DIC株式会社 2019-03-26 CN disclosed
CN-108368214-A NOVOLAC RESIN AND RESIST FILM DIC株式会社 2018-08-03 CN disclosed
CN-105555820-B Manufacturing method, photosensitive composite, erosion resistant and the film of modified hydroxyl naphthol novolak varnish gum, modified hydroxyl naphthol novolak varnish gum DIC株式会社 2018-06-29 CN disclosed
CN-105555820-A Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating DAINIPPON INK & CHEMICALS 2016-05-04 CN disclosed
CN-105190439-A Modified phenolic novolac resin, resist material, coating film, and permanent resist film DAINIPPON INK &AMP 2015-12-23 CN disclosed