Maleic Acid

Maleic Acid

SCHEMBL2804945

CC(C)(C)OOC(C)(C)C.O=C(O)/C=C\C(=O)O

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol

The experimentally established mechanism targets of Maleic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.53
TP53 P04637 1/20 0.53
EGLN1 Q9GZT9 1/20 0.53
EGLN3 Q9H6Z9 1/20 0.53
HCAR2 Q8TDS4 7/20 0.48
TDP1 Q9NUW8 4/20 0.47
ALDH1A1 P00352 6/20 0.37
HSD17B10 Q99714 3/20 0.37
ALOX15 P16050 2/20 0.37
RECQL P46063 2/20 0.37
GAA P10253 1/20 0.37
GABRP O00591 2/20 0.35
GABRD O14764 2/20 0.35
GABRA1 P14867 2/20 0.35
GABRB1 P18505 2/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35
GABRA5 P31644 2/20 0.35
GABRA3 P34903 2/20 0.35
GABRA2 P47869 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fumaric Acid SCHEMBL9380769 1.00 TSHR (0.53) TSHRTP53EGLN1EGLN3HCAR2
Crotonic Acid SCHEMBL27676453 0.87 TSHR (0.40) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL4928444 0.83 TSHR (0.36) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL11226261 0.83 HCAR2 (0.50) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL3878187 0.83 HCAR2 (0.50) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL16466651 0.83 HCAR2 (0.50) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL1116590 0.82 HCAR2 (0.45) TSHRTP53EGLN1EGLN3HCAR2
SCHEMBL1116591 0.82 HCAR2 (0.45) TSHRTP53EGLN1EGLN3HCAR2
Fumaric Acid SCHEMBL29110380 0.82 HCAR2 (0.55) TSHRTP53EGLN1EGLN3HCAR2
Maleic Acid SCHEMBL27407467 0.82 ALDH1A1 (0.53) TSHRTP53EGLN1EGLN3HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102149523-B Method for producing conglomerate stone articles comprising the use of peroxide initiators Luca Tonchley (IT) 2015-08-19 CN claimed
US-8435424-B2 Solvent-free conductive paste composition and solar cell element employing the same ETERNAL CHEMICAL CO., LTD. (TW) 2013-05-07 US claimed
CN-102898962-A Dual-curing adhesive composition ETERNAL CHEMICAL INDUSTRY CO LTD 2013-01-30 CN claimed
CN-102149523-A Method for producing conglomerate stone articles comprising the use of peroxide initiators TONCELLI LUCA 2011-08-10 CN claimed
US-20100186823-A1 SOLVENT-FREE CONDUCTIVE PASTE COMPOSITION AND SOLAR CELL ELEMENT EMPLOYING THE SAME ETERNAL CHEMICAL CO., LTD. 2010-07-29 US claimed
CN-119731284-A Adhesive composition, adhesive layer, adhesive sheet, optical member with adhesive layer, image display device, and touch panel 日东电工株式会社 2025-03-28 CN disclosed
CN-119432246-A Optical adhesive sheet 日东电工株式会社 2025-02-14 CN disclosed
CN-119432248-A Optical adhesive sheet 日东电工株式会社 2025-02-14 CN disclosed
CN-119432247-A Optical adhesive sheet 日东电工株式会社 2025-02-14 CN disclosed
CN-119161823-A Pressure-sensitive adhesive sheet, optical member with pressure-sensitive adhesive layer, and image display device 日东电工株式会社 2024-12-20 CN disclosed
CN-112996839-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-18 CN disclosed
CN-107567473-A Injection molding rubber composition 和仁化学株式会社 2018-01-09 CN disclosed
US-5260164-A Silver halide, organic silver salt, cyclic reducing agent, the above compounds adapted to provide imagewise oxidized product of reducing agent upon imagewise exposure and heat development, polymer precursor, photopolymerization initiator CANON KABUSHIKI KAISHA (JP) 1993-11-09 US disclosed
US-5114990-A Olefin polymerization with inorganic oxide pigments in the presence of an olefin catalyst FELIX SCHOELLER JR. GMBH KG (DE) 1992-05-19 US disclosed
US-5064744-A Heat, photopolymerization, silver halide contrast CANON KABUSHIKI KAISHA (JP) 1991-11-12 US disclosed
EP-0358388-A2 Composition for polymerization with improved activator system E.I. DU PONT DE NEMOURS AND COMPANY (US) 1990-03-14 EP disclosed
EP-0356253-A2 Polymerization process for methyl methacrylate with improved activator system E.I. DU PONT DE NEMOURS AND COMPANY (US) 1990-02-28 EP disclosed
EP-0330504-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-30 EP disclosed
US-4839324-A MALEIC ACID PERESTER SALT AND BISULFITE; POLYMETHYL METHACRYLATE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1989-06-13 US disclosed
US-4831093-A PERESTER SALT OF MALEIC ACID AND BISULFITE IN WATER-IN-OIL EMULSION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1989-05-16 US disclosed