Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | CES2 | O00748 | 1/20 | 0.47 |
| ▸ | CES1 | P23141 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 4/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.38 |
| ▸ | ELANE | P08246 | 2/20 | 0.38 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.37 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.37 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | GGT1 | P19440 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3578203 | 0.84 | LMNA (0.47) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL277654 | 0.82 | HPGD (0.56) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL30682789 | 0.82 | LMNA (0.55) | LMNACES2CES1MAPK1ALDH1A1 | |
| Methoxymethane SCHEMBL5593577 | 0.81 | HPGD (0.55) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL17363854 | 0.81 | LMNA (0.44) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL173919 | 0.79 | KDM4E (0.62) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL6528611 | 0.79 | LMNA (0.49) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL2818437 | 0.79 | IRAK4 (0.58) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL124171 | 0.79 | LMNA (0.52) | LMNACES2CES1MAPK1ALDH1A1 | |
| SCHEMBL31058864 | 0.78 | LMNA (0.47) | LMNACES2CES1MAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117120925-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-116981998-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-116964527-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-10-27 | — | — | CN | disclosed |
| CN-116783549-A | Photosensitive laminate, method of manufacturing photosensitive laminate, and method of manufacturing circuit board using the same | 可隆工业株式会社 | 2023-09-19 | — | — | CN | disclosed |
| CN-116745698-A | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board | 可隆工业株式会社 | 2023-09-12 | — | — | CN | disclosed |
| CN-116724273-A | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board | 可隆工业株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-116547320-A | Photosensitive element, dry film photoresist, resist pattern, circuit board and display device using the same | 可隆工业株式会社 | 2023-08-04 | — | — | CN | disclosed |
| WO-2022211457-A1 | PHOTOSENSITIVE LAMINATE AND METHOD OF MANUFACTURING CIRCUIT BOARD | 코오롱인더스트리 주식회사 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022211455-A1 | PHOTOSENSITIVE LAMINATE AND METHOD OF MANUFACTURING CIRCUIT BOARD | 코오롱인더스트리 주식회사 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022211456-A1 | PHOTOSENSITIVE LAMINATE, AND CIRCUIT BOARD MANUFACTURING METHOD | 코오롱인더스트리 주식회사 | 2022-10-06 | — | — | WO | disclosed |
| US-20060111493-A1 | Photopolymerizable resin composition for sandblast resist | KOLON INDUSTRIES, INC. (KR) | 2006-05-25 | — | — | US | disclosed |
| EP-1546808-A1 | PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR SANDBLAST RESIST | Kolon Industries, Inc. (KR) | 2005-06-29 | — | — | EP | disclosed |
| WO-2004023212-A1 | PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR SANDBLAST RESIST | KOLON INDUSTRIES INC. (KR) | 2004-03-18 | — | — | WO | disclosed |
| CN-1082679-C | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRIC CORP (JP) | 2002-04-10 | — | — | CN | disclosed |
| EP-0741332-B1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORP (JP) | 2000-08-09 | — | — | EP | disclosed |
| US-5924912-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5916738-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| CN-1140843-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRIC CORP (JP) | 1997-01-22 | — | — | CN | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |