Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCF1 | P14598 | 6/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.36 |
| ▸ | NOS3 | P29474 | 3/20 | 0.36 |
| ▸ | NOS1 | P29475 | 3/20 | 0.36 |
| ▸ | NOS2 | P35228 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | CNR1 | P21554 | 2/20 | 0.33 |
| ▸ | CNR2 | P34972 | 2/20 | 0.33 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7149339 | 0.93 | NCF1 (0.42) | NCF1KDM4ESMN1; SMN2L3MBTL1MEN1 | |
| SCHEMBL990306 | 0.88 | CNR1 (0.43) | KDM4ESMN1; SMN2L3MBTL1NOS3NOS1 | |
| SCHEMBL29366362 | 0.88 | L3MBTL1 (0.43) | KDM4ESMN1; SMN2L3MBTL1NOS3NOS1 | |
| SCHEMBL268758 | 0.88 | L3MBTL1 (0.43) | KDM4ESMN1; SMN2L3MBTL1NOS3NOS1 | |
| SCHEMBL392406 | 0.87 | CNR1 (0.44) | L3MBTL1NOS3NOS1NOS2MEN1 | |
| SCHEMBL29402318 | 0.87 | CNR1 (0.44) | L3MBTL1NOS3NOS1NOS2MEN1 | |
| SCHEMBL15476088 | 0.84 | NOS3 (0.37) | SMN1; SMN2L3MBTL1NOS3NOS1NOS2 | |
| SCHEMBL267070 | 0.81 | MYC (0.35) | NCF1L3MBTL1MAPK14 | |
| SCHEMBL29860074 | 0.81 | MYC (0.35) | NCF1L3MBTL1MAPK14 | |
| SCHEMBL15475516 | 0.81 | EGFR (0.34) | L3MBTL1NOS3NOS1NOS2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | claimed |
| US-8404402-B2 | Photopolymerisable system for hologram formation | SONY DADC AUSTRIA AG (AT) | 2013-03-26 | — | — | US | disclosed |
| US-20100248088-A1 | PHOTOPOLYMERISABLE SYSTEM FOR HOLOGRAM FORMATION | SONY DADC AUSTRIA AG (AT) | 2010-09-30 | — | — | US | disclosed |
| EP-2233976-A1 | Photopolymerisable system for hologram formation | Sony DADC Austria AG (AT) | 2010-09-29 | — | — | EP | disclosed |
| EP-1426793-B1 | Photodefinable composition including a silsesquioxane polymer and an optical waveguide formed therefrom | SHIPLEY CO LLC (US) | 2009-02-25 | — | — | EP | disclosed |
| US-7024093-B2 | Methods of forming waveguides and waveguides formed therefrom | SHIPLEY COMPANY, LLC (US) | 2006-04-04 | — | — | US | disclosed |
| US-20050180712-A1 | PHOTOIMAGEABLE WAVEGUIDE COMPOSITION AND WAVEGUIDE FORMED THEREFROM | SHIPLEY COMPANY, L.L.C. (US) | 2005-08-18 | — | — | US | disclosed |
| US-6842577-B2 | Photoimageable waveguide composition and waveguide formed therefrom | SHIPLEY COMPANY L.L.C. (US) | 2005-01-11 | — | — | US | disclosed |
| US-20040218889-A1 | Methods of forming waveguides and waveguides formed therefrom | SHIPLEY COMPANY, L.L.C. | 2004-11-04 | — | — | US | disclosed |
| EP-1434068-A2 | Methods of forming waveguides that are rounded in cross section and waveguides formed therefrom | Shipley Company, L.L.C. (US) | 2004-06-30 | — | — | EP | disclosed |
| US-5070001-A | LIGHT-SENSITIVE MIXTURE FOR PRODUCING POSITIVE OR NEGATIVE RELIEF COPIES | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-12-03 | — | — | US | disclosed |
| EP-0302359-A2 | Positive photo-sensitive compositions | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-02-08 | — | — | EP | disclosed |
| US-4789619-A | Positive-working radiation-sensitive mixture comprising a sensitizing polymethine dye | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-12-06 | — | — | US | disclosed |
| EP-0266654-A2 | Light sensitive composition, material containing it and process for producing positive or negative relief copies by using this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-05-11 | — | — | EP | disclosed |
| EP-0224161-A2 | Positive photosensitive composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-06-03 | — | — | EP | disclosed |
| US-4506006-A | Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-03-19 | — | — | US | disclosed |
| US-4506003-A | Positive-working radiation-sensitive mixture | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-03-19 | — | — | US | disclosed |
| US-4250247-A | COMPRISING AN ACID-FORMING COMPOUND AND A COMPOUND HAVING AS AN ACID-CLEAVABLE GROUP AN N-ACYLIMINOCARBONATE; RELIEF IMAGES; OFFSET PRINTING | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| US-4248957-A | ENOL ETHER CONTAINING COMPOUND OF WHICH THE SOLUBILITY IN DEVELOPER INCREASES ON CLEAVAGE | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | disclosed |
| US-4247611-A | ACETAL RESIN, ACID DONER | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-27 | — | — | US | disclosed |