SCHEMBL28165142

SCHEMBL28165142

CC(=NOS(=O)(=O)c1ccc(C)cc1)c1ccc([N+](=O)[O-])cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.53
ALDH1A1 P00352 4/20 0.53
PKM P14618 2/20 0.51
ACHE P22303 2/20 0.49
HSD17B10 Q99714 1/20 0.49
KMT2A Q03164 4/20 0.47
LMNA P02545 2/20 0.47
MEN1 O00255 2/20 0.47
GAA P10253 2/20 0.47
HPGD P15428 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP3A4 P08684 1/20 0.46
CYP2D6 P10635 1/20 0.46
THRB P10828 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
POLB P06746 1/20 0.45
MAPK1 P28482 1/20 0.44
FAAH O00519 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14395720 0.82 CYP1A2 (0.58) MAPTALDH1A1PKMKMT2ALMNA
SCHEMBL13033693 0.82 STAT3 (0.51) MAPTALDH1A1PKMKMT2ALMNA
SCHEMBL31565026 0.81 LMNA (0.46) MAPTALDH1A1KMT2ALMNAMEN1
SCHEMBL92088 0.81 LMNA (0.46) MAPTALDH1A1KMT2ALMNAMEN1
SCHEMBL15396142 0.81 MAPT (0.48) MAPTALDH1A1PKMACHEHSD17B10
SCHEMBL13567344 0.81 ALDH1A1 (0.53) MAPTALDH1A1PKMACHEKMT2A
SCHEMBL13461573 0.80 SMN1; SMN2 (0.42) MAPTALDH1A1KMT2ALMNAMEN1
SCHEMBL7296406 0.79 MAPT (0.53) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL29525036 0.79 MEN1 (0.60) MAPTALDH1A1PKMACHEHSD17B10
SCHEMBL7296409 0.79 MAPT (0.53) MAPTALDH1A1KMT2AMEN1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107077070-A The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices 东丽株式会社 2017-08-18 CN disclosed