SCHEMBL28200316

SCHEMBL28200316

Cc1ccc(S(=O)(=O)OS(=O)(=O)OC(C(=O)c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.47
ALDH1A1 P00352 4/20 0.47
NPSR1 Q6W5P4 2/20 0.46
CYP2C19 P33261 3/20 0.43
CYP1A2 P05177 2/20 0.43
CYP2C9 P11712 2/20 0.43
TDP1 Q9NUW8 2/20 0.42
TP53 P04637 1/20 0.42
RECQL P46063 1/20 0.42
LMNA P02545 4/20 0.41
GAA P10253 1/20 0.41
HTT P42858 1/20 0.41
MAPT P10636 3/20 0.40
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
POLB P06746 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL60545 0.89 CYP3A4 (0.51) CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2
SCHEMBL27826514 0.84 CYP3A4 (0.48) CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2
SCHEMBL10807674 0.81 RECQL (0.50) ALDH1A1NPSR1TDP1TP53RECQL
SCHEMBL10452675 0.79 NPSR1 (0.44) CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2
SCHEMBL194578 0.79 ALDH1A1 (0.54) CYP3A4ALDH1A1NPSR1TDP1LMNA
SCHEMBL19862495 0.78 ALDH1A1 (0.50) CYP3A4ALDH1A1NPSR1TDP1LMNA
SCHEMBL11260413 0.76 KEAP1 (0.46) ALDH1A1NPSR1TDP1TP53RECQL
SCHEMBL3096091 0.76 RECQL (0.49) CYP3A4ALDH1A1NPSR1CYP2C19CYP2C9
SCHEMBL10813751 0.76 NPC1 (0.61) CYP3A4ALDH1A1NPSR1CYP2C19TDP1
SCHEMBL4893120 0.76 NPSR1 (0.51) CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107703658-A The manufacture method of substrate 东京应化工业株式会社 2018-02-16 CN disclosed