Quinoline

Quinoline

SCHEMBL28212331

O=Nc1ccc(O)c2ncccc12.c1ccc2ncccc2c1

nearest known ligand 0.78

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 6/20 0.78
KDM4E B2RXH2 6/20 0.78
MAPT P10636 5/20 0.78
NPC1 O15118 5/20 0.78
TDP1 Q9NUW8 4/20 0.78
RAB9A P51151 3/20 0.78
ALDH1A1 P00352 3/20 0.78
NPSR1 Q6W5P4 2/20 0.78
XBP1 P17861 1/20 0.78
BRD4 O60885 2/20 0.56
GLO1 Q04760 4/20 0.55
MEN1 O00255 8/20 0.52
KMT2A Q03164 8/20 0.52
HTT P42858 3/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
LMNA P02545 3/20 0.52
MAPK1 P28482 2/20 0.52
OPRK1 P41145 1/20 0.52
HSP90AA1 P07900 4/20 0.49
KLF5 Q13887 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105461 0.88 L3MBTL1 (1.00) L3MBTL1KDM4EMAPTNPC1TDP1
SCHEMBL29624594 0.88 L3MBTL1 (1.00) L3MBTL1KDM4EMAPTNPC1TDP1
Hydrochloric Acid SCHEMBL6865586 0.87 L3MBTL1 (0.97) L3MBTL1KDM4EMAPTNPC1TDP1
SCHEMBL31157828 0.87 L3MBTL1 (0.97) L3MBTL1KDM4EMAPTNPC1TDP1
Cloxyquin SCHEMBL27791015 0.78 KDM4E (0.76) L3MBTL1KDM4EMAPTNPC1TDP1
Quinoline SCHEMBL28083472 0.78 ALDH1A1 (0.52) L3MBTL1KDM4EMAPTNPC1TDP1
Quinoline SCHEMBL28215883 0.78 HSP90AA1 (0.76) L3MBTL1KDM4EMAPTNPC1TDP1
Tiliquinol SCHEMBL28097990 0.78 HTT (0.76) L3MBTL1KDM4EMAPTNPC1TDP1
SCHEMBL14424703 0.76 L3MBTL1 (0.75) L3MBTL1KDM4EMAPTNPC1TDP1
Oxyquinoline SCHEMBL6064682 0.74 MAPT (0.58) L3MBTL1KDM4EMAPTNPC1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104285184-B Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-09-25 CN disclosed
CN-107850844-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-03-27 CN disclosed