Benzene

Benzene

SCHEMBL28228740

O=[SH](=O)c1ccccc1.c1ccccc1

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BBOX1 O75936 4/20 0.37
EHMT2 Q96KQ7 3/20 0.37
EHMT1 Q9H9B1 3/20 0.37
CA2 P00918 1/20 0.36
CA4 P22748 1/20 0.36
CA5A P35218 1/20 0.36
ALDH1A1 P00352 5/20 0.35
ALOX15 P16050 2/20 0.35
TSHR P16473 2/20 0.35
ALOX12 P18054 1/20 0.35
PTGS1 P23219 1/20 0.35
SLC6A2 P23975 1/20 0.35
MAPK1 P28482 1/20 0.35
PTGS2 P35354 1/20 0.35
HTR2B P41595 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CES2 O00748 2/20 0.33
CES1 P23141 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28801712 0.97 BBOX1 (0.35) BBOX1EHMT2EHMT1CA2CA4
Hydrochloric Acid SCHEMBL28762594 0.97 BBOX1 (0.35) BBOX1EHMT2EHMT1CA2CA4
SCHEMBL29127374 0.97 BBOX1 (0.35) BBOX1EHMT2EHMT1CA2CA4
Acetic Acid SCHEMBL14764595 0.86 CES2 (0.42) ALDH1A1ALOX15TSHRHSD17B10TDP1
SCHEMBL28835548 0.86
Phosphoric Acid SCHEMBL28483871 0.86 CA2 (0.52) CA2CA4CA5AALDH1A1ALOX15
SCHEMBL13866589 0.82 ALDH1A1 (0.50) CA2ALDH1A1TSHRPTGS1MAPK1
SCHEMBL14085594 0.81
SCHEMBL20745855 0.80 CA4 (0.33) CA2CA4TSHR
Propiolic Acid SCHEMBL15344642 0.80 ALDH1A1 (0.33) CA2CA4CA5AALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110099974-A Composition is used in the formation of substrate protective layer 日产化学株式会社 2019-08-06 CN disclosed
CN-109196051-A Peeling layer, which is formed, uses composition and peeling layer 日产化学株式会社 2019-01-11 CN disclosed
CN-109153851-A Peeling layer, which is formed, uses composition and peeling layer 日产化学株式会社 2019-01-04 CN disclosed
CN-109153852-A Peeling layer, which is formed, uses composition and peeling layer 日产化学株式会社 2019-01-04 CN disclosed
CN-104119533-B Polyimide film, the polyimide laminate containing it and the polyimide metal laminate containing it 宇部兴产株式会社 2018-06-26 CN disclosed