Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol
The experimentally established mechanism targets of Naphthalene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 4/20 | 0.56 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.56 |
| ▸ | TNKS | O95271 | 1/20 | 0.56 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.56 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.56 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.56 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.56 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.56 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.56 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.56 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.56 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.56 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.56 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.53 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthalene SCHEMBL2834576 | 1.00 | HCAR2 (0.56) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Naphthalene SCHEMBL28796710 | 0.95 | HCAR2 (0.52) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Naphthalene SCHEMBL28312215 | 0.85 | HCAR2 (0.48) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Cinnamic Acid SCHEMBL1791128 | 0.83 | HCAR2 (0.86) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Biphenyl SCHEMBL5421614 | 0.82 | ALDH1A1 (0.63) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Biphenyl SCHEMBL9816554 | 0.82 | ALDH1A1 (0.63) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Naphthalene SCHEMBL30742789 | 0.82 | LMNA (0.59) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Biphenyl SCHEMBL10898338 | 0.82 | ALDH1A1 (0.63) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Biphenyl SCHEMBL28611778 | 0.82 | ALDH1A1 (0.63) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Naphthalene SCHEMBL3296369 | 0.82 | LMNA (0.59) | HCAR2HDAC3TNKSHDAC4HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3717579-B1 | AQUEOUS ELECTRON BEAM CURABLE COMPOSITIONS COMPRISING POLY(ALKOXYLATES) | SUN CHEMICAL CORP (US) | 2022-01-26 | — | — | EP | disclosed |
| CN-108473501-B | Therapeutic compounds, compositions and methods of use thereof | 豪夫迈·罗氏有限公司 | 2021-07-16 | — | — | CN | disclosed |
| EP-2065456-B2 | RESIN COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL | KOATSU GAS KOGYO (JP) | 2021-03-31 | — | — | EP | disclosed |
| EP-3717579-A1 | AQUEOUS ELECTRON BEAM CURABLE COMPOSITIONS COMPRISING POLY(ALKOXYLATES) | Sun Chemical Corporation (US) | 2020-10-07 | — | — | EP | disclosed |
| WO-2020012158-A1 | AQUEOUS ELECTRON BEAM CURABLE COMPOSITIONS COMPRISING POLY(ALKOXYLATES) | SUN CHEMICAL CORPORATION (US) | 2020-01-16 | — | — | WO | disclosed |
| CN-110506082-A | Aqueous ink composition, ink group, image forming method and resin for printing ink particle | FUJIFILM CORP | 2019-11-26 | — | — | CN | disclosed |
| CN-106062087-B | Pigment complex including synergist and polymer coating | 卡博特公司 | 2019-03-12 | — | — | CN | disclosed |
| CN-109071986-A | Ink group and image recording process | 富士胶片株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-108976906-A | A kind of preparation method of the black water base writing ink of purple food-grade | 太原理工大学 | 2018-12-11 | — | — | CN | disclosed |
| CN-105658743-B | Include the printing ink composition of the surfactant with limited solubility | 卡博特公司 | 2018-08-17 | — | — | CN | disclosed |
| CN-107406701-A | Aqueous ink composition, ink group, image forming method and resin particle | 富士胶片株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-107003451-A | Thermal isolation film and its manufacture method and use its insulator | 柯尼卡美能达株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-106062087-A | Pigment composites comprising synergists and polymer coatings | 卡博特公司 | 2016-10-26 | — | — | CN | disclosed |
| EP-2841511-A1 | INKJET INK | Hewlett-Packard Development Company, L.P. (US) | 2015-03-04 | — | — | EP | disclosed |
| US-8609763-B2 | Resin composition for vibration damping material and vibration damping material | KOATSU GAS KOGYO CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| WO-2013162513-A1 | INKJET INK | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2013-10-31 | — | — | WO | disclosed |
| US-20100010107-A1 | RESIN COMPOSITION FOR VIBRATION DAMPING MATERIAL AND VIBRATION DAMPING MATERIAL | KOATSU GAS KOGYO CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2065456-A1 | RESIN COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL | Koatsu Gas Kogyo Co., Ltd. (JP) | 2009-06-03 | — | — | EP | disclosed |
| CN-1063870-A | Ring-substituted 2-amino-1, 2, 3, 4-tetrahydronaphthalenes and 3-aminochromanes | LILLY CO ELI (US) | 1992-08-26 | — | — | CN | disclosed |
| US-4171369-A | ANALGESICS, ANTIDEPRESSANTS | SANDOZ LTD. (CH) | 1979-10-16 | — | — | US | disclosed |