Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | TSHR | P16473 | 5/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | SI | P14410 | 1/20 | 0.30 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18979685 | 0.87 | TSHR (0.55) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL9305952 | 0.86 | TSHR (0.59) | THRBTSHRLMNAALDH1A1POLB | |
| SCHEMBL19012669 | 0.84 | TSHR (0.61) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL4863944 | 0.84 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL7634480 | 0.84 | TSHR (0.50) | THRBTSHRLMNAALDH1A1HSD17B10 | |
| SCHEMBL12101451 | 0.84 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL24282638 | 0.83 | THRB (0.47) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL9136225 | 0.82 | THRB (0.56) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL9136217 | 0.82 | THRB (0.56) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL7717191 | 0.82 | THRB (0.50) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11691034-B2 | Methods for strengthening and repairing nails using curable compositions | FAMOUS NAMES, LLC (US) | 2023-07-04 | — | — | US | claimed |
| JP-4041515-A | — | — | None | — | — | JP | disclosed |
| WO-2025079705-A1 | COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING MATERIAL, CURED PRODUCT, AND IMAGE DISPLAY DEVICE | 大阪有機化学工業株式会社 | 2025-04-17 | — | — | WO | disclosed |
| US-20210024674-A1 | POLYMER COMPOUND, COMPOSITION, INSULATING LAYER, AND ORGANIC THIN FILM TRANSISTOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-01-28 | — | — | US | disclosed |
| US-10719014-B2 | Photoresists comprising amide component | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-21 | — | — | US | disclosed |
| CN-110119067-A | Thermal acid generators for photoresist | 罗门哈斯电子材料有限公司 | 2019-08-13 | — | — | CN | disclosed |
| CN-110049869-A | Extrusion matt foil with improved mechanical performance and high-weatherability | 赢创罗姆有限公司 | 2019-07-23 | — | — | CN | disclosed |
| US-9541834-B2 | Ionic thermal acid generators for low temperature applications | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-10 | — | — | US | disclosed |
| US-9298093-B2 | Polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2016-03-29 | — | — | US | disclosed |
| CN-102653576-B | Polymkeric substance, the formation method of photo-corrosion-resisting agent composition and photoengraving pattern | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2015-10-21 | — | — | CN | disclosed |
| US-5194547-A | Methacrylic acid ester polymer containing at least one acetal or ketal group; paints, adhesives, molding materials | DAINIPPON INK & CHEMICALS, INC. (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0243120-B1 | TOUGH FLEXIBLE POLYMER BLENDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-20 | — | — | EP | disclosed |
| JP-H0441515-A | ANIONIC LIVING POLYMER AND POLYMER DERIVED THEREFROM | DAINIPPON INK & CHEM INC | 1992-02-12 | — | — | JP | disclosed |
| EP-0465835-A1 | Anionic living polymers, their derivatives and composition comprising them | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-01-15 | — | — | EP | disclosed |
| US-5015566-A | Silver halide emulsion coated on a support, hydrophobic colloids | EASTMAN KODAK COMPANY (US) | 1991-05-14 | — | — | US | disclosed |
| US-5003004-A | Star Polymers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-03-26 | — | — | US | disclosed |
| EP-0358187-A2 | Tabular grain photographic elements exhibiting reduced pressure sensitivity (II) | EASTMAN KODAK COMPANY (US) | 1990-03-14 | — | — | EP | disclosed |
| EP-0355224-A1 | 1,4 -O- metallation process and composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-02-28 | — | — | EP | disclosed |
| US-4785126-A | PROMOTERS, POLYMERIZATION CATALYSTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-11-15 | — | — | US | disclosed |
| EP-0243120-A2 | Tough flexible polymer blends | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-10-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10719014-B2 | Photoresists comprising amide component | ASPH, ALAD, SUN2 | THRB 4638/4885TSHR 4127/4885LMNA 4405/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.