SCHEMBL28371476

SCHEMBL28371476

Cc1ccc(OC(=O)Oc2cccc3cc4cc5ccccc5cc4cc23)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.45
▸ ALDH1A1 P00352 4/20 0.44
▸ LMNA P02545 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ FNTA P49354 1/20 0.40
▸ FNTB P49356 1/20 0.40
▸ GAA P10253 3/20 0.40
▸ HSD17B10 Q99714 2/20 0.40
▸ PGR P06401 1/20 0.40
▸ PTGS1 P23219 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ ESR1 P03372 1/20 0.40
▸ ESR2 Q92731 1/20 0.40
▸ KDM4E B2RXH2 2/20 0.40
▸ USP2 O75604 1/20 0.39
▸ HPGD P15428 1/20 0.38
▸ POLB P06746 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28371867 0.88 ALDH1A1 (0.44) MAPTALDH1A1CYP1A2CYP2C19GAA
SCHEMBL28339440 0.88 ALDH1A1 (0.49) MAPTALDH1A1CYP1A2CYP2C19GAA
SCHEMBL28372155 0.87 LMNA (0.50) MAPTALDH1A1LMNACYP1A2CYP3A4
SCHEMBL19468524 0.86 ALDH1A1 (0.50) MAPTALDH1A1CYP1A2CYP2C19GAA
SCHEMBL29591103 0.86 ALDH1A1 (0.50) MAPTALDH1A1CYP1A2CYP2C19GAA
SCHEMBL28376052 0.85 ALDH1A1 (0.42) ALDH1A1CYP1A2GAAHSD17B10PGR
SCHEMBL28372649 0.85 KMT2A (0.47) MAPTALDH1A1GAAHSD17B10PGR
SCHEMBL28377393 0.83 ALDH1A1 (0.53) MAPTALDH1A1CYP1A2CYP2C19GAA
SCHEMBL28376484 0.83 ESR1 (0.59) MAPTLMNAFNTAFNTBGAA
SCHEMBL28375858 0.82 KDM4E (0.50) ALDH1A1GAAHSD17B10PGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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