SCHEMBL28376052

SCHEMBL28376052

Cc1ccccc1OC(=O)Oc1cccc2cc3cc4ccccc4cc3cc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.42
▸ HSD17B10 Q99714 4/20 0.42
▸ GAA P10253 2/20 0.42
▸ PGR P06401 1/20 0.42
▸ PTGS1 P23219 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ KDM4E B2RXH2 2/20 0.41
▸ KMT2A Q03164 4/20 0.40
▸ MEN1 O00255 3/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ ESR1 P03372 1/20 0.40
▸ ESR2 Q92731 1/20 0.40
▸ ATM Q13315 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ HPGD P15428 2/20 0.40
▸ CYP1A2 P05177 1/20 0.39
▸ NOTUM Q6P988 2/20 0.39
▸ RAB9A P51151 1/20 0.38
▸ PPARG P37231 1/20 0.38
▸ BCHE P06276 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28339440 0.91 ALDH1A1 (0.49) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL29591103 0.89 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL19468524 0.89 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28377393 0.86 ALDH1A1 (0.53) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28371476 0.85 MAPT (0.45) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28375858 0.84 KDM4E (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28371867 0.84 ALDH1A1 (0.44) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28372155 0.84 LMNA (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28376619 0.84 TYMS (0.46) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL6509391 0.83 KDM4E (0.51) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
Send feedback