SCHEMBL28371867

SCHEMBL28371867

O=C(Oc1ccccc1)Oc1cccc2cc3cc4ccccc4cc3cc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.44
▸ KDM4E B2RXH2 5/20 0.44
▸ GAA P10253 2/20 0.44
▸ MAPT P10636 3/20 0.42
▸ TDP1 Q9NUW8 2/20 0.42
▸ HSD17B10 Q99714 4/20 0.42
▸ HPGD P15428 3/20 0.42
▸ KMT2A Q03164 4/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ GLA P06280 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ PGR P06401 1/20 0.41
▸ PTGS1 P23219 1/20 0.41
▸ MAPK1 P28482 1/20 0.41
▸ PPARG P37231 1/20 0.40
▸ NCOA2 Q15596 1/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ RXFP1 Q9HBX9 1/20 0.40
▸ TRPV1 Q8NER1 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28339440 0.93 ALDH1A1 (0.49) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL19468524 0.92 ALDH1A1 (0.50) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL29591103 0.92 ALDH1A1 (0.50) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL28377393 0.89 ALDH1A1 (0.53) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL28371476 0.88 MAPT (0.45) ALDH1A1KDM4EGAAMAPTHSD17B10
SCHEMBL28372649 0.88 KMT2A (0.47) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL28372155 0.87 LMNA (0.50) ALDH1A1KDM4EGAAMAPTHSD17B10
SCHEMBL537475 0.85 ALDH1A1 (0.56) ALDH1A1KDM4EGAAMAPTTDP1
SCHEMBL28376052 0.84 ALDH1A1 (0.42) ALDH1A1KDM4EGAATDP1HSD17B10
SCHEMBL28375858 0.84 KDM4E (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111413849-B Photosensitive composition, preparation method thereof, pattern forming method and application 常州强力先端电子材料有限公司 2024-03-01 — — CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 — — CN disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-111413849-A Photosensitive composition, preparation method thereof, pattern forming method and application 常州强力先端电子材料有限公司 2020-07-14 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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