SCHEMBL28396649

SCHEMBL28396649

C=C(C)C(=O)OCCCCC([SiH3])(OC)OC

nearest known ligand 0.54

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.54
THRB P10828 1/20 0.43
POLB P06746 1/20 0.42
APEX1 P27695 1/20 0.42
HTT P42858 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
ALDH1A1 P00352 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21066702 0.98 TSHR (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL23923096 0.98 TSHR (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL26918774 0.98 TSHR (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL1024052 0.98 TSHR (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL21066745 0.98 TSHR (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL419928 0.95 TSHR (0.51) TSHRTHRBPOLBAPEX1HTT
SCHEMBL734093 0.88 THRB (0.47) TSHRTHRBPOLBAPEX1HTT
SCHEMBL5199000 0.84 TSHR (0.42) TSHRTHRBPOLBAPEX1HTT
SCHEMBL9469051 0.84 TSHR (0.45) TSHRTHRBPOLBAPEX1HTT
SCHEMBL486168 0.84 TSHR (0.56) TSHRTHRBPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
CN-106866971-B Weather-resistant low-temperature-resistant organic silicon impact modifier and preparation method and application thereof 广东优科艾迪高分子材料有限公司 2020-05-05 CN claimed
CN-109716491-B Method for manufacturing field effect transistor and method for manufacturing wireless communication device 东丽株式会社 2023-06-09 CN disclosed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN disclosed
CN-111534149-B High-adhesion ink and preparation method thereof 厦门欧化实业有限公司 2022-06-03 CN disclosed
CN-111534149-A High-adhesion ink and preparation method thereof 厦门欧化实业有限公司 2020-08-14 CN disclosed
CN-106866971-B Weather-resistant low-temperature-resistant organic silicon impact modifier and preparation method and application thereof 广东优科艾迪高分子材料有限公司 2020-05-05 CN disclosed