SCHEMBL28493344

SCHEMBL28493344

N#CC(=NOS(=O)(=O)Cc1ccccc1)c1ccsc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD11B1 P28845 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.38
▸ HTT P42858 2/20 0.38
▸ GAA P10253 1/20 0.38
▸ ALOX12 P18054 1/20 0.38
▸ GPR52 Q9Y2T5 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ HPGD P15428 1/20 0.33
▸ LCK P06239 1/20 0.33
▸ FYN P06241 1/20 0.33
▸ DAO P14920 1/20 0.33
▸ CHRM2 P08172 1/20 0.32
▸ CHRM3 P20309 1/20 0.32
▸ F2 P00734 2/20 0.32
▸ PRSS1 P07477 2/20 0.32
▸ PRSS2 P07478 2/20 0.32
▸ PRSS3 P35030 2/20 0.32
▸ PLA2G7 Q13093 1/20 0.32
▸ MAPT P10636 3/20 0.31
▸ CA1 P00915 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1417510 0.86 KMT2A (0.42) ALDH1A1HTTKMT2AF2PRSS1
SCHEMBL30726870 0.86 KMT2A (0.42) ALDH1A1HTTKMT2AF2PRSS1
SCHEMBL2262634 0.79 MAPT (0.39) HSD11B1ALDH1A1HTTGAAALOX12
SCHEMBL2262629 0.79 MAPT (0.39) HSD11B1ALDH1A1HTTGAAALOX12
SCHEMBL5361602 0.78 ALDH1A1 (0.43) HSD11B1ALDH1A1HTTKMT2AMAPT
SCHEMBL30726881 0.78 ALDH1A1 (0.43) HSD11B1ALDH1A1HTTKMT2AMAPT
SCHEMBL28493343 0.75 MAPT (0.35) HSD11B1ALDH1A1HTTGAAALOX12
SCHEMBL6124073 0.73 SMN1; SMN2 (0.47) ALDH1A1HTTGAAKMT2AHPGD
SCHEMBL2700595 0.72 PLA2G7 (0.43) ALDH1A1HTTHPGDPLA2G7MAPT
SCHEMBL2700597 0.72 PLA2G7 (0.43) ALDH1A1HTTHPGDPLA2G7MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 — — CN disclosed
CN-108107676-B Chemically amplified positive resist film laminate and pattern formation method 信越化学工业株式会社 2023-02-21 — — CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 — — CN disclosed
CN-109563371-B Polysiloxane composition comprising acetal-protected silanol groups 日产化学株式会社 2021-09-21 — — CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 — — CN disclosed
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 — — CN disclosed
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