SCHEMBL28493343

SCHEMBL28493343

Cc1ccccc1S(=O)(=O)ON=C(C#N)c1ccsc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.35
▸ TDP1 Q9NUW8 1/20 0.35
▸ GAA P10253 3/20 0.34
▸ ALDH1A1 P00352 3/20 0.34
▸ ALOX12 P18054 2/20 0.34
▸ HTT P42858 1/20 0.34
▸ LMNA P02545 3/20 0.34
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ POLB P06746 2/20 0.34
▸ NFKB1 P19838 1/20 0.34
▸ NFKB2 Q00653 1/20 0.34
▸ RELA Q04206 1/20 0.34
▸ KMT2A Q03164 5/20 0.33
▸ MEN1 O00255 3/20 0.33
▸ ESR1 P03372 2/20 0.33
▸ ESR2 Q92731 2/20 0.33
▸ HSD11B1 P28845 1/20 0.33
▸ ATM Q13315 1/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1417509 0.85 PLA2G7 (0.40) MAPTTDP1GAAALDH1A1LMNA
SCHEMBL27705172 0.85 PLA2G7 (0.40) MAPTTDP1GAAALDH1A1LMNA
SCHEMBL2262634 0.81 MAPT (0.39) MAPTTDP1GAAALDH1A1ALOX12
SCHEMBL2262629 0.81 MAPT (0.39) MAPTTDP1GAAALDH1A1ALOX12
SCHEMBL2798958 0.81 MAPT (0.44) MAPTTDP1GAAALDH1A1ALOX12
SCHEMBL382727 0.81 MAPT (0.44) MAPTTDP1GAAALDH1A1ALOX12
SCHEMBL382729 0.81 MAPT (0.44) MAPTTDP1GAAALDH1A1ALOX12
SCHEMBL28940695 0.80 LIPG (0.33) HSD11B1
SCHEMBL6809982 0.80 POLB (0.38) MAPTGAAALDH1A1SMN1; SMN2POLB
SCHEMBL7790655 0.77 P2RX7 (0.39) MAPTGAAALDH1A1SMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 — — CN disclosed
CN-108107676-B Chemically amplified positive resist film laminate and pattern formation method 信越化学工业株式会社 2023-02-21 — — CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 — — CN disclosed
CN-109563371-B Polysiloxane composition comprising acetal-protected silanol groups 日产化学株式会社 2021-09-21 — — CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 — — CN disclosed
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 — — CN disclosed
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