SCHEMBL30726870

SCHEMBL30726870

N#C/C(=N\OS(=O)(=O)Cc1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 2/20 0.42
▸ PLA2G7 Q13093 1/20 0.41
▸ PRSS1 P07477 3/20 0.37
▸ PRSS2 P07478 3/20 0.37
▸ PRSS3 P35030 3/20 0.37
▸ F2 P00734 2/20 0.37
▸ CA1 P00915 2/20 0.37
▸ CA2 P00918 2/20 0.37
▸ MMP1 P03956 1/20 0.37
▸ MMP2 P08253 1/20 0.37
▸ MMP9 P14780 1/20 0.37
▸ MMP8 P22894 1/20 0.37
▸ MMP13 P45452 1/20 0.37
▸ FAAH O00519 1/20 0.36
▸ ELANE P08246 1/20 0.36
▸ PRTN3 P24158 1/20 0.36
▸ CA5A P35218 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ TSHR P16473 2/20 0.36
▸ HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1417510 1.00 KMT2A (0.42) KMT2APLA2G7PRSS1PRSS2PRSS3
SCHEMBL5361602 0.88 ALDH1A1 (0.43) KMT2AHTTALDH1A1CYP1A2CYP3A4
SCHEMBL30726881 0.88 ALDH1A1 (0.43) KMT2AHTTALDH1A1CYP1A2CYP3A4
SCHEMBL28493344 0.86 HSD11B1 (0.39) KMT2APLA2G7PRSS1PRSS2PRSS3
SCHEMBL2700595 0.85 PLA2G7 (0.43) PLA2G7HTTALDH1A1CYP1A2CYP3A4
SCHEMBL2700597 0.85 PLA2G7 (0.43) PLA2G7HTTALDH1A1CYP1A2CYP3A4
SCHEMBL2702574 0.81 PLA2G7 (0.40) KMT2APLA2G7ALDH1A1MAPTSMN1; SMN2
SCHEMBL2702572 0.81 PLA2G7 (0.40) KMT2APLA2G7ALDH1A1MAPTSMN1; SMN2
SCHEMBL295508 0.80 PLA2G7 (0.46) PLA2G7TSHRHTTALDH1A1MAPT
SCHEMBL36190 0.80 PLA2G7 (0.46) PLA2G7TSHRHTTALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108073042-B Positive photosensitive resin composition 株式会社东进世美肯 2024-01-23 — — CN disclosed
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