Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | DBH | P09172 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | ACE2 | Q9BYF1 | 2/20 | 0.40 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | USP5 | P45974 | 1/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.37 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.36 |
| ▸ | DRD3 | P35462 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13144198 | 0.84 | ALDH1A1 (0.50) | KDM4EDBHGAARECQLCYP2C9 | |
| SCHEMBL6675694 | 0.83 | ALDH1A1 (0.44) | ACE2ABCB11ACHEUSP5TRPA1 | |
| SCHEMBL548540 | 0.82 | KMT2A (0.48) | GAAABCB11POLB | |
| SCHEMBL9988577 | 0.82 | GRIA4 (0.51) | ACE2USP5TRPA1GRIA4 | |
| SCHEMBL11134845 | 0.81 | STAT3 (0.44) | KDM4EDBHGAARECQLACHE | |
| SCHEMBL5616922 | 0.80 | PARP10 (0.48) | RECQLABCB11ACHEPOLB | |
| SCHEMBL10121174 | 0.80 | KDM4E (0.62) | KDM4EDBHGAARECQLADRA2B | |
| SCHEMBL2641075 | 0.80 | ABCB11 (0.52) | ABCB11ACHETRPA1CYP2C9FFAR1 | |
| SCHEMBL195312 | 0.79 | CYP2C9 (0.53) | KDM4EDBHGAARECQLUSP5 | |
| SCHEMBL6452937 | 0.79 | KDM4E (0.52) | KDM4EDBHGAARECQLUSP5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-107428717-B | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2021-04-23 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |