SCHEMBL28533528

SCHEMBL28533528

CCC(c1ccc(O)c(NC(C)C)c1)c1ccc(O)c(NC(C)C)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 5/20 0.43
PTGS2 P35354 1/20 0.43
OPRK1 P41145 1/20 0.43
SLC6A3 Q01959 1/20 0.43
IDO1 P14902 1/20 0.42
GAA P10253 6/20 0.41
ALDH1A1 P00352 4/20 0.41
HSD17B10 Q99714 4/20 0.41
HPGD P15428 2/20 0.41
USP2 O75604 1/20 0.41
PKM P14618 1/20 0.41
ALOX15 P16050 1/20 0.41
BCHE P06276 2/20 0.41
TYR P14679 2/20 0.41
ACHE P22303 2/20 0.41
ADRB3 P13945 4/20 0.40
LMNA P02545 4/20 0.40
HTT P42858 2/20 0.40
MAPT P10636 5/20 0.39
MAPK1 P28482 4/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28539633 0.88 ALDH1A1 (0.41) ADRB2PTGS2OPRK1SLC6A3GAA
SCHEMBL28535622 0.82 ADRB2 (0.40) ADRB2IDO1GAAALDH1A1HSD17B10
SCHEMBL3934205 0.75 TDP1 (0.56) ADRB2PTGS2OPRK1SLC6A3ALDH1A1
SCHEMBL28091172 0.75 TRPA1 (0.53) PTGS2OPRK1SLC6A3IDO1GAA
SCHEMBL4543829 0.74 IDO1 (0.50) IDO1MAPTKDM4EPOLB
SCHEMBL131117 0.73 BCHE (0.47) ADRB2PTGS2OPRK1SLC6A3GAA
SCHEMBL4389791 0.73 RORC (0.56) ADRB2PTGS2OPRK1SLC6A3GAA
SCHEMBL29459520 0.72 ESR1 (0.48) GAAALDH1A1HSD17B10HPGDUSP2
SCHEMBL28091168 0.72 GAA (0.49) IDO1GAAALDH1A1HSD17B10HPGD
SCHEMBL529617 0.72 ESR1 (0.48) GAAALDH1A1HSD17B10HPGDUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112512747-B Polishing pad and method for producing polished product 富士纺控股株式会社 2024-04-05 CN disclosed
CN-116897097-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-17 CN disclosed
CN-116887946-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-13 CN disclosed
CN-116867606-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-10 CN disclosed
CN-116568734-A Polishing pad, method for producing same, method for producing polished article, and polishing pad, method for producing same, and method for producing polished article 富士纺控股株式会社 2023-08-08 CN disclosed
CN-116348245-A Polishing pad and method for producing polished product 富士纺控股株式会社 2023-06-27 CN disclosed
CN-116323100-A Polishing pad 富士纺控股株式会社 2023-06-23 CN disclosed
CN-108349062-B Polishing material, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-04-09 CN disclosed
CN-112512747-A Polishing pad and method for manufacturing polished article 富士纺控股株式会社 2021-03-16 CN disclosed
CN-109195745-B Polishing pad, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-02-05 CN disclosed