SCHEMBL28596222

SCHEMBL28596222

COc1ccc(C(O)(CCc2ccccc2)c2ccccc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.55
ALDH1A1 P00352 1/20 0.55
KIF11 P52732 4/20 0.53
KCNH2 Q12809 1/20 0.53
LMNA P02545 1/20 0.52
HTT P42858 1/20 0.52
NPC1 O15118 2/20 0.50
RAB9A P51151 2/20 0.50
LTA4H P09960 1/20 0.49
KMT2A Q03164 2/20 0.46
GAA P10253 1/20 0.46
TAAR1 Q96RJ0 1/20 0.46
MEN1 O00255 1/20 0.44
ATM Q13315 1/20 0.44
CHRM2 P08172 2/20 0.44
CHRM4 P08173 2/20 0.44
CHRM5 P08912 2/20 0.44
CHRM1 P11229 2/20 0.44
CHRM3 P20309 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28065368 0.84 SMN1; SMN2 (0.52) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL9837849 0.83 LMNA (0.55) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL28076878 0.83 KIF11 (0.55) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL28076876 0.83 KIF11 (0.55) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL28598321 0.81 MEN1 (0.59) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL8612119 0.81 LTA4H (0.53) SMN1; SMN2ALDH1A1KIF11KCNH2LMNA
SCHEMBL3294808 0.81 CYP2D6 (0.54) KCNH2HTTLTA4HKMT2AMEN1
SCHEMBL25620281 0.80 LTA4H (0.52) SMN1; SMN2ALDH1A1KIF11KCNH2NPC1
SCHEMBL28076975 0.80 KIF11 (0.54) SMN1; SMN2KIF11KCNH2LMNAHTT
SCHEMBL28076974 0.80 KIF11 (0.54) SMN1; SMN2KIF11KCNH2LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108292094-B Resist pattern forming method and resist material 国立大学法人大阪大学 2021-07-20 CN claimed
CN-108292094-B Resist pattern forming method and resist material 国立大学法人大阪大学 2021-07-20 CN disclosed