SCHEMBL2864459

SCHEMBL2864459

CO[Si](C)(OC)c1cc([Si](C)(OC)OC)cc([Si](C)(OC)OC)c1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482415 0.83 ALDH1A1 (0.35) ALDH1A1
SCHEMBL2864359 0.83 ACHE (0.31) ALDH1A1
SCHEMBL15734222 0.81 CA12 (0.32)
SCHEMBL397346 0.80 CA12 (0.30)
SCHEMBL15738793 0.79 TUBB1 (0.33)
SCHEMBL13239724 0.76 NR1H2 (0.40)
SCHEMBL15738264 0.75 NOTUM (0.37)
SCHEMBL15341258 0.74 RIPK1 (0.30)
SCHEMBL2860931 0.73 ALDH1A1 (0.30) ALDH1A1
SCHEMBL6436993 0.73 ESR2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154708-B1 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device SHINETSU CHEMICAL CO (JP) 2017-07-26 EP disclosed
US-9260458-B2 Method of producing an organic silicon compound DOW CORNING CORPORATION (US) 2016-02-16 US disclosed
US-20150141689-A1 Method Of Producing An Organic Silicon Compound DOW TORAY CO., LTD. (JP) 2015-05-21 US disclosed
US-8277600-B2 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-02 US disclosed
US-20100040895-A1 HIGH-TEMPERATURE BONDING COMPOSITION, SUBSTRATE BONDING METHOD, AND 3-D SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-02-18 US disclosed
EP-2154708-A1 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-02-17 EP disclosed