SCHEMBL2864359

SCHEMBL2864359

CO[Si](C)(OC)c1cccc([Si](C)(OC)OC)c1

nearest known ligand 0.31

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 2/20 0.31
CYP3A4 P08684 2/20 0.30
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30
CYP1A1 P04798 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2E1 P05181 1/20 0.30
CYP2C8 P10632 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2A6 P11509 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP4B1 P13584 1/20 0.30
CYP2B6 P20813 1/20 0.30
CYP3A5 P20815 1/20 0.30
CYP2A7 P20853 1/20 0.30
CYP3A7 P24462 1/20 0.30
CYP2F1 P24903 1/20 0.30
CYP2C18 P33260 1/20 0.30
CYP2C19 P33261 1/20 0.30
CYP2J2 P51589 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL387599 0.86 ACHE (0.46) ACHEALDH1A1
SCHEMBL28062826 0.84 ALDH1A1 (0.41) CYP3A4NOTUMALDH1A1
SCHEMBL28203247 0.84 IDO1 (0.31)
SCHEMBL9804222 0.84 ALDH1A1 (0.47) CYP3A4CA1CA2CA7CA9
SCHEMBL15750814 0.84 ACHE (0.41) ACHENOTUM
SCHEMBL28062720 0.84 ALDH1A1 (0.41) CYP1A2ALDH1A1
SCHEMBL2864459 0.83 ALDH1A1 (0.30) ALDH1A1
SCHEMBL49103 0.81 ESR1 (0.41) ACHEESR1ESR2CYP1A2CYP2C19
SCHEMBL574627 0.81 ACHE (0.32) ACHECYP3A4CYP1A1CYP1A2CYP2E1
SCHEMBL15750812 0.80 L3MBTL1 (0.42) CYP1A2NOTUMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154708-B1 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device SHINETSU CHEMICAL CO (JP) 2017-07-26 EP disclosed
US-9260458-B2 Method of producing an organic silicon compound DOW CORNING CORPORATION (US) 2016-02-16 US disclosed
US-20150141689-A1 Method Of Producing An Organic Silicon Compound DOW TORAY CO., LTD. (JP) 2015-05-21 US disclosed
EP-2797855-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND Dow Corning Toray Co., Ltd. (JP) 2014-11-05 EP disclosed
US-8604126-B2 Silicone resin composition and optical material SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-12-10 US disclosed
WO-2013100166-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND DOW CORNING TORAY CO., LTD. (JP) 2013-07-04 WO disclosed
US-8277600-B2 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-02 US disclosed
US-20120184674-A1 SILICONE RESIN COMPOSITION AND OPTICAL MATERIAL SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20100233482-A1 Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device HAMADA YOSHITAKA 2010-09-16 US disclosed
US-7754330-B2 Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-13 US disclosed
US-20100040895-A1 HIGH-TEMPERATURE BONDING COMPOSITION, SUBSTRATE BONDING METHOD, AND 3-D SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-02-18 US disclosed
EP-2154708-A1 High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-02-17 EP disclosed
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE PANASONIC CORPORATION (JP) 2009-12-03 US disclosed
US-20090294726-A1 ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SPOP, OSTC, SEM1 ACHE 246/4885CYP3A4 2743/4885ESR1 2311/4885
US-20120184674-A1 SILICONE RESIN COMPOSITION AND OPTICAL MATERIAL RAD51, SEM1, SMCHD1 ACHE 3015/4885CYP3A4 2668/4885ESR1 650/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.