SCHEMBL2868913

SCHEMBL2868913

CC(C)O[SiH](OC(C)C)C(C)CCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15643171 0.81
SCHEMBL5833137 0.79 DNM1 (0.33)
SCHEMBL357385 0.79
SCHEMBL9561515 0.78
SCHEMBL1782326 0.77 ENPEP (0.31)
SCHEMBL111199 0.76 OPRM1 (0.30)
SCHEMBL27730681 0.75 ALDH1A1 (0.33)
SCHEMBL2242179 0.74 TSHR (0.36)
SCHEMBL1931181 0.73 NFKB1 (0.32)
SCHEMBL17937798 0.72 CYP3A4 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140295109-A1 FILM WITH TRANSPARENT ELECTROCONDUCTIVE MEMBRANE AND ITS USE DAINIPPON PRINTING CO LTD (JP) 2014-10-02 US disclosed
US-7812530-B2 Flexible substrate and organic device using the same DAI NIPPON PRINTING CO., LTD. (JP) 2010-10-12 US disclosed
US-20090291293-A1 FILM WITH TRANSPARENT ELECTROCONDUCTIVE MEMBRANE AND ITS USE DAI NIPPON PRINTING CO., LTD. (JP) 2009-11-26 US disclosed
US-7378157-B2 Gas barrier film, and display substrate and display using the same DAI NIPPON PRINTING CO., LTD. (JP) 2008-05-27 US disclosed
US-20060093758-A1 Gas barrier film, and display substrate and display using the same DAI NIPPON PRINTING CO., LTD. (JP) 2006-05-04 US disclosed
US-20050236985-A1 Flexible substrate and organic device using the same DAI NIPPON PRINTING CO., LTD. (JP) 2005-10-27 US disclosed
EP-0671450-B1 USE OF A SURFACE TREATMENT COMPOSITION FOR COATINGS REDUCING THE PERMEABILITY FOR GASES NIPPON CATALYTIC CHEM IND (JP) 2002-08-21 EP disclosed
US-5728770-A COMPRISING A SILANE, ORGANOMETALLIC COMPOUMD, A COMPOUND WITH TWO FUNCTIONAL GROUPS AND A SOLVENT; EXCELLENT GAS BARRIER PROPERTIES NIPPON SHOKUBAI CO., LTD. (JP) 1998-03-17 US disclosed
EP-0671450-A1 SURFACE TREATMENT COMPOSITION AND SURFACE-TREATED RESIN MOLDING NIPPON SHOKUBAI CO., LTD. (JP) 1995-09-13 EP disclosed